Publication detail

Thin Plasma Polymer Films Of Hexamethyldisiloxane

ČECH, V. PŘIKRYL, R. SALYK, O.

Original Title

Thin Plasma Polymer Films Of Hexamethyldisiloxane

Type

conference paper

Language

English

Original Abstract

Plasma enhanced chemical vapor technology was used to prepare thin polymer film from a vapor of hexamethyldisiloxane (HMDSO) monomer. An influence of deposition conditions on properties of films was observed. Plasma processes were diagnosticated employing the mass spectroscopy. Chemical composition and structure of prepared layers were studied by the infrared spectroscopy (FTIR) and the electron spectroscopy for chemical analysis (ESCA). Surface morphology of films was observed by the scanning electron microscopy (SEM), the profilometer Talystep and the atomic force microscopy (AFM). We measured the surface energy, evaluated the thermal stability using thermogravimetric analysis together with the mass spectroscopy and investigated an adhesion of films to substrates. Some mechanical properties were tested as well.

Keywords

thin film, plasma polymerization

Authors

ČECH, V.; PŘIKRYL, R.; SALYK, O.

RIV year

2000

Released

30. 6. 2000

Publisher

UK Praha

Location

Praha

ISBN

80-85863-59-6

Book

Proceedings of WDS 2000

Pages from

318

Pages to

321

Pages count

4

BibTex

@inproceedings{BUT2561,
  author="Vladimír {Čech} and Ota {Salyk} and Radek {Přikryl}",
  title="Thin Plasma Polymer Films Of Hexamethyldisiloxane",
  booktitle="Proceedings of WDS 2000",
  year="2000",
  pages="4",
  publisher="UK Praha",
  address="Praha",
  isbn="80-85863-59-6"
}