Publication detail

Plasma polymer films prepared in RF inductive coupling system

ČECH, V., PŘIKRYL, R., STUDÝNKA, J., VANĚK, J.

Original Title

Plasma polymer films prepared in RF inductive coupling system

Type

journal article - other

Language

English

Original Abstract

We would like to demonstrate a possibility to deposit plasma polymer films of high reproducibility and controlled physico-chemical properties. Plasma polymer films were prepared by plasma-enhanced chemical vapor deposition (PE CVD) employing an RF helical coupling system [1] operated at continuous or pulsed regime. The effective power (Weff) of pulsed plasma was controlled by changing the ratio of the time when plasma is switched on (ton) to the time when plasma is switched off (toff), Weff = Wtotal x ton/(ton+ toff), where Wtotal= 50 W. Vinyltriethoxysilane (VTES) was used as the monomer. Thin films were deposited on silicon wafers or special microscope slides without flaws pretreated by Ar plasma (10 sccm, 10 Pa, 25 W) for 10 min. Employing a mechanical manipulator the pretreated substrate was placed into the plasma zone after plasma reached the steady state monitored by mass spectroscopy. The film thickness was measured by a Profiler Talystep (Taylor-Hobson) or a spectroscopic phase-modulated ellipsometer UVISEL (Jobin Yvon).

Keywords

plasma, polymer, film, modulus

Authors

ČECH, V., PŘIKRYL, R., STUDÝNKA, J., VANĚK, J.

RIV year

2005

Released

1. 9. 2005

Location

Brno, Czech Republic

ISBN

0009-2770

Periodical

Chemické listy

Year of study

99

Number

09

State

Czech Republic

Pages from

446

Pages to

447

Pages count

2

BibTex

@article{BUT45810,
  author="Vladimír {Čech} and Jan {Vaněk} and Jan {Studýnka} and Radek {Přikryl}",
  title="Plasma polymer films prepared in RF inductive coupling system",
  journal="Chemické listy",
  year="2005",
  volume="99",
  number="09",
  pages="446--447",
  issn="0009-2770"
}