Publication detail

NDT of thick film resistors by noise spectroscopy

SEDLÁKOVÁ, V.

Original Title

NDT of thick film resistors by noise spectroscopy

Type

conference paper

Language

English

Original Abstract

The noise spectroscopy measurements of thick-film resistors are proposed as a non-destructive testing method for the quality and reliability prediction and possible types of failure evaluation. The thick-film layer structure consists of metallic grains and inter-grain glass layers. Junctions between the metallic grains and glass layers are sources of noise and non-linearity. Important sources of noise are in the vicinity of defects and in the contact region. The main advantages of a noise testing are higher sensitivity than DC measurements during life tests. The kinds of noise spectra in view of reliability diagnostic are mainly the typical poor-device indicators like burst noise, generation-recombination noise, 1/f noise, and the 1/fa noise. The non-linearity of the thick-film layer structure is proportional to the distortion of the pure harmonic signal applied to the sample, and is connected with physical anomalies. The noise spectroscopy and non-linearity NDT can be used to adjust technology

Keywords

noise, non-linearity, thick-film

Authors

SEDLÁKOVÁ, V.

RIV year

2002

Released

1. 1. 2002

Publisher

Ing. Zdeněk Novotný, CSc.

Location

Brno

ISBN

80-214-2115-0

Book

Proceedings of 8th Conference STUDENT EEICT 2002

Edition number

1

Pages from

244

Pages to

248

Pages count

5

BibTex

@inproceedings{BUT5729,
  author="Vlasta {Sedláková}",
  title="NDT of thick film resistors by noise spectroscopy",
  booktitle="Proceedings of 8th Conference STUDENT EEICT 2002",
  year="2002",
  number="1",
  pages="5",
  publisher="Ing. Zdeněk Novotný, CSc.",
  address="Brno",
  isbn="80-214-2115-0"
}