Publication detail

Electron Ionization of Dimethylphenylsilane - Appearance Energies of Selected Ionic Fragments

KOČIŠEK, J. STRUŽÍNSKÝ, O. SAHÁNKOVÁ, H. KRČMA, F. MATEJČÍK, Š.

Original Title

Electron Ionization of Dimethylphenylsilane - Appearance Energies of Selected Ionic Fragments

Type

journal article - other

Language

English

Original Abstract

Electron ionization (EI) to dimethylphenylsilane (DMPS) is studied in crossed electron-molecular beams experiment. Using this technique with improved energy resolution of the electron beam, the positive mass spectra and the relative partial cross sections for EI to DMPS are obtained. The ionization energy of DMPS of 9.04 +- 0.06eV and the threshold energies for dissociative ionization channels are estimated. The bond dissociation energies for single bond cleavage channels are also estimated on the basis of experimental observations. The detection of doubly charged ions of DMPS2+ (AE=26.3 +- eV) as well as several other doubly charged fragments is discussed in detail.

Keywords

appearance energy;dimethylphenylsilane;electron ionization;organometallic vapour deposition;thin films

Authors

KOČIŠEK, J.; STRUŽÍNSKÝ, O.; SAHÁNKOVÁ, H.; KRČMA, F.; MATEJČÍK, Š.

RIV year

2012

Released

16. 3. 2012

ISBN

1612-8850

Periodical

Plasma Processes and Polymers

Year of study

9

Number

3

State

Federal Republic of Germany

Pages from

298

Pages to

303

Pages count

6

BibTex

@article{BUT74088,
  author="Jaroslav {Kočišek} and Ondřej {Stružínský} and Hana {Sahánková} and František {Krčma} and Štefan {Matejčík}",
  title="Electron Ionization of Dimethylphenylsilane - Appearance Energies of Selected Ionic Fragments",
  journal="Plasma Processes and Polymers",
  year="2012",
  volume="9",
  number="3",
  pages="298--303",
  issn="1612-8850"
}