Publication detail

Thickness measurement of thin soft organic films

MLADENOVA, D. SIDEROV, V. ZHIVKOV, I. SALYK, O. OHLÍDAL, M. YORDANOVA, I. YORDANOV, R. PHILIPPOV, P. WEITER, M.

Original Title

Thickness measurement of thin soft organic films

Type

lecture

Language

English

Original Abstract

This paper compares chromatic white light (CWL) and interference microscope measurements aiming to find a proper non-contact method for a thickness determination of thin soft organic films. Standard samples with vacuum deposited aluminum films of different thicknesses in the range of 50-1000 nm were prepared and measured by both methods. It was found that the CWL technique is proper for a measurement of thin soft organic films with higher than 40-50 nm film thicknesses. As a complementary feature of the method 2D and 3D surface morphology imaging of the films could be recorded and the surface film roughness could be calculated. In a case of optical inhomogeneity the method requires covering with a uniform high reflective coating. The interference microscopy method results in a relatively lower film thickness with a higher standard deviation and a higher standard relative error. It could be connected with the resolution of the interferograms measured.

Keywords

film thickness, chromatic white light, interference microscopy, thin soft organic films

Authors

MLADENOVA, D.; SIDEROV, V.; ZHIVKOV, I.; SALYK, O.; OHLÍDAL, M.; YORDANOVA, I.; YORDANOV, R.; PHILIPPOV, P.; WEITER, M.

Released

9. 5. 2012

Location

35th International Spring Seminar on Electronics Technology, ISSE 2012, Bad Aussee, Austria

BibTex

@misc{BUT94437,
  author="MLADENOVA, D. and SIDEROV, V. and ZHIVKOV, I. and SALYK, O. and OHLÍDAL, M. and YORDANOVA, I. and YORDANOV, R. and PHILIPPOV, P. and WEITER, M.",
  title="Thickness measurement of thin soft organic films",
  year="2012",
  address="35th International Spring Seminar on Electronics Technology, ISSE 2012, Bad Aussee, Austria",
  note="lecture"
}