Přístupnostní navigace
E-application
Search Search Close
Course detail
FCH-MAO_TVRAcad. year: 2012/2013
The structure of the lecture includes a definition of basic terms; introduction to vacuum science, plasma physics, and plasma chemistry; vacuum and plasma technologies for thin film deposition: vacuum evaporation, sputtering, plasma polymerization, the use of lasers for thin film deposition, chemical vapor deposition; characterization of thin films: film growth, determination of film thickness, scanning probe microscopy (STM, AFM, EFM, MFM, SNOM), mechanical properties (measuring techniques, tension, adhesion).
Language of instruction
Number of ECTS credits
Mode of study
Guarantor
Department
Learning outcomes of the course unit
Prerequisites
Co-requisites
Planned learning activities and teaching methods
Assesment methods and criteria linked to learning outcomes
Course curriculum
Work placements
Aims
Specification of controlled education, way of implementation and compensation for absences
Recommended optional programme components
Prerequisites and corequisites
Basic literature
Recommended reading
Classification of course in study plans
branch NPCO_CHM , 1 year of study, summer semester, compulsory-optional
branch CKCO_CZV , 1 year of study, summer semester, compulsory-optional
Lecture
Teacher / Lecturer