Czech

Not applicable.

Students acquire basic knowledge about thin-film technology, characterization and application.

Basic chemistry and physics.

Not applicable.

The course uses teaching methods in form of Lecture - 2 teaching hours per week. The e-learning system (LMS Moodle) is available to teachers and students.

Oral exam is aimed at basic knowledge about thin film technologies and thin film characterization.

Introduction / information sources
Fundamentals of vacuum science
Introduction to plasma physics and chemistry
Physical vapor deposition
Chemical vapor deposition
Plasma-enhanced chemical vapor deposition
Film growth
Film thickness
Scanning probe microscopy
Mechanical properties
Chemical analysis of films
Film properties

Not applicable.

Knowledge about advanced technologies and analyses of thin films is the aims of this subject.

Participation at lectures is not mandatory.

Not applicable.

Not applicable.

D.M. Hoffman, B. Singh, J.H. Thomas, Handbook of Vacuum Science and Technology, Academic Press 1998 (CS)
Eckertová L.: Fyzika tenkých vrstev. SNTL, Praha 1973. (CS)
Hoffman D., Singh B., Thomas J. H.: Handbook of Vacuum Science and Technology. Academic Press, San Diego 1998. (CS)
M. Ohring, The Materials Science of Thin Films, Academic Press 2001 (CS)
Mironov V. L.: Fundamentals of Scanning Probe Microscopy. Tekhnosfera, Moscow 2004. (CS)
N. Inagaki, Plasma Surface Modification and Plasma Polymerization, Technomic 1996 (CS)
Ohring M.: Materials Science of Thin Films. Academic Press, San Diego 2002. (CS)

Not applicable.