Course detail

Plasma Chemical Processes and Technologies II

FCH-MCO_PLT2Acad. year: 2013/2014

The course focusses on the plasma chemical processes and technologies that are nowadays used in laboratory as well industrial practice. The lectures are held preferentially by experts from practice (from research as well as industrial practice). The excursions to selected laboratories or industrial units are organized if it is possible.
Course is open in odd years. Lectures from precedent year (course Plasma chemical processes and technologies I) are not repeated.

Language of instruction

Czech

Number of ECTS credits

2

Mode of study

Not applicable.

Learning outcomes of the course unit

Students will obtain overview of contemporarz technologies as well as directions for further research and development.

Prerequisites

none

Co-requisites

Not applicable.

Planned learning activities and teaching methods

The course uses teaching methods in form of Lecture - 2 teaching hours per week. The e-learning system (LMS Moodle) is available to teachers and students.

Assesment methods and criteria linked to learning outcomes

The examen is done as test composed from four tasks linked to each of presented topics. Presentations in pdf format are disposable for students at elearning.

Course curriculum

List of topics (actual offer is continuosly upgraded):
1. Natural plasma, 2. Thermonuclear fusion and its perspectives, 3. Illumination technics, plasma displayes, 4. Gas lasers, excimers, 5. Electron, atomic and molecular beams, 6. Electric arc, 7. Switches, 8. Plasma etching, manufacturing of microelectronics, 9. Reactive particles generation and organic synthezes under plasma conditions, 10. Hard coatings (PACVD, PECVD), 11. Plasma sputtering - magnetron, diode, high frequency, 12. DLC layrs depositions, 13. Surface treatment of polymers (non-polymer forming plasmas), 14. Plassma polymerization (polymer forming plasmas), grafting, 15. Semipermeabile membranes, sensors based on plasma polymers, 16. Polymeric layers for applications in composites, 17. Corrosion layers reduction, 18. Formation of nanoparticles in plasmas, nanotechnologies, 19. Plasma spraying, plasmatrons, 20. Plasma sterilization, 21. Laser ablation spectroscopy (LIBS), 22. VOC decomposition in thermal and non-thermal plasmas, 23. Discharges in liquids I - principles of discharge generation, shock waves, 24. Discharges in liquids II - Active particles generation, decomposition, sterilization, 25. Post-discharges and their applications, 26. Pulsed plasmas, 27. Plasma chemical processes in planetary atmospheres, 28. Ozone generation.

Course is open in odd years. Lectures from precedent year (course Plasma chemical processes and technologies I) are not repeated.

Work placements

Not applicable.

Aims

The goal of course is to present the contemporarz state of art from the view point of research, development as well as industrial practice.

Specification of controlled education, way of implementation and compensation for absences

none

Recommended optional programme components

Not applicable.

Prerequisites and corequisites

Not applicable.

Basic literature

Chen F., Chang J. P.: Principles of Plasma Processing. Kluwer Academic, Plenum Publishers, NewYork 2003. (CS)
Roth J. R.: Industrial Plasma Engineering Volume 1: Principles. Institute of Physics Publishing, Bristol and Philadelphia 1995. (CS)
Roth J. R.: Industrial Plasma Engineering Volume 2: Applications to Nonthermal Plasma Processing. Institute of Physics Publishing, Bristol and Philadelphia 2001. (CS)

Recommended reading

Not applicable.

Classification of course in study plans

  • Programme NKCP_SCH Master's

    branch NKCO_SCH , 1 year of study, winter semester, compulsory-optional

  • Programme NPCP_SCH Master's

    branch NPCO_SCH , 2 year of study, winter semester, compulsory-optional

  • Programme NKCP_SCH Master's

    branch NKCO_SCH , 2 year of study, winter semester, compulsory-optional

Type of course unit

 

Lecture

26 hod., optionally

Teacher / Lecturer