Course detail

Principles of Equipment for Physical Technologies

FSI-TPZ-AAcad. year: 2014/2015

The course gives summary of high technologies for deposition of thin films and multilayers, coatings, etching of surfaces, alloying of materials and fabrication of nanostructures. Course primarily gives an explanation of physical principles of these processes and describes physical background of the corresponding experimental tools.

Language of instruction

English

Number of ECTS credits

3

Mode of study

Not applicable.

Guarantor

prof. RNDr. Tomáš Šikola, CSc.

Department

Institute of Physical Engineering (ÚFI)

Offered to foreign students

Of all faculties

Learning outcomes of the course unit

The course will help a student to get basic knowledge on modern vacuum technologies and, hence, to choose a diploma and/or PhD project.

Prerequisites

Atomic Physics, Solid State Physics, Quantum Physics, Statistical Physics and Thermodynamics, Vacuum Physics and Technology.

Co-requisites

Not applicable.

Planned learning activities and teaching methods

The course is taught through lectures explaining the basic principles and theory of the discipline. Exercises are focused on practical topics presented in lectures.

Assesment methods and criteria linked to learning outcomes

The class ticket (credit) is obtained according to the performance and quality of work at practice lessons (individually calculated examples and a project). At the examination the performance of students at practising will be taken into account, consultation of teaching materials, textbooks and notes during writing a test is allowed. At the oral part of the exam discussions on physical principles of vacuum technologies and relevant experimental facilities will be carried out.

Course curriculum

Not applicable.

Work placements

Not applicable.

Aims

To provide students basic knowledge on modern methods of thin film/multilayer fabrication and other state-of-the-art technologies (e.g. nanostructure fabrication).

Specification of controlled education, way of implementation and compensation for absences

The presence of students at practice is obligatory and is monitored by a tutor. The way how to compensate missed practice lessons will be decided by a tutor.

Recommended optional programme components

Not applicable.

Prerequisites and corequisites

Not applicable.

Basic literature

BRODIE, I. - MURAY, J. J.: The Physics of Micro/Nano-Fabrication
D. HALLIDAY, R. RESNICK, J. WALKER: Fyzika. (2. přepracované vydání.) VUTIUM, Brno 2013 (CS)
CHEN, F. F.: Úvod do fyziky plazmatu
J. C. RIVIERE: Surface Analytical Techniques, Clarendon Press, Oxford 1990 (EN)
L. ECKERTOVÁ: Fyzikální elektronika pevných látek, Karolinum, Praha 1992 (CS)
VÁLYI, L.: Atom and Ion Sources

Recommended reading

ECKERTOVÁ, L.: Elektronika povrchů
ECKERTOVÁ, L.: Fyzika tenkých vrstev
RIVIERE, J. C.: Surface Analytical Techniques

Classification of course in study plans

  • Programme B3901-3 Bachelor's

    branch B-FIN , 3 year of study, summer semester, compulsory

Type of course unit

 

Lecture

26 hod., optionally

Teacher / Lecturer

prof. RNDr. Tomáš Šikola, CSc.
Ing. Stanislav Voborný, Ph.D.

Syllabus

Introduction to physical technologies.
Summary and characterization of selected physical technologies. Industrial applications of physical technologies.
Principles of physical technologies and relevant experimental facilities. Electron beam sources: parameters and a design of electron sources. Ion sources: parameters and a design of ion sources. Electron and ion optical system elements. Plasma as a source of chemically active particles. Photon sources, optical systems.
Atomic and molecular beam sources. Interaction of particles with materials (electrons, ions, neutral particles, photons).
Principles of layer growth. Physical technologies. Deposition of thin films and coatings, fabrication of nanostructures (evaporation, CVD, PECVD, sputtering, direct deposition, etc.)
Etching of surfaces, thin films and coatings (chemical etching, plasma and ion beam etching). Epitaxy. Doping (diffusion, ion implantation). Ion beam mixing of atoms. Annealing by electron and laser beams. Lithography.
Analysis of surfaces and thin films – overview. New trends in advanced material technologies.
Application of individual methods (STM, AFM, TEM, SEM, AES, RBS, SIMS, XPS, LEED, RHEED,etc.).

Exercise

6 hod., compulsory

Teacher / Lecturer

prof. RNDr. Tomáš Šikola, CSc.
Ing. Stanislav Voborný, Ph.D.

Syllabus

In addition to calculation of supportive theoretical examples (taking place during the whole semester), the students work on individual projects (computer code SIMION).

Computer-assisted exercise

7 hod., compulsory

Teacher / Lecturer

prof. RNDr. Tomáš Šikola, CSc.

Syllabus

At practicing in a computational lab the students will learn to use a computer code SIMION for a design of optical systems of electron and ion beam facilities.