Course detail

Advanced Experimental Methods II

FSI-TSIAcad. year: 2019/2020

First option of the course is devoted to the basic and advanced optical measurement methods and their engineering applications.
The second option of the course is aimed at the experiments in the field of surface and thin film physics.

Language of instruction

Czech

Number of ECTS credits

4

Mode of study

Not applicable.

Guarantor

Ing. Michal Urbánek, Ph.D.

Department

Institute of Physical Engineering (ÚFI)

Learning outcomes of the course unit

In the first option, students acquire knowledge and skills necessary for designing of optical systems, measurements and observations.
The second option is intended to gain of practical skills in typical experimental techniques and procedures in the field of surface and thin film physics.
In both options of the course, students experience experimental work in a team, gain the competence to apply theoretical knowledge during the practical measurement and to present the results of their work in a written form.

Prerequisites

The knowledge of engineering and applied optics is expected for the first option of the course; the second option of the course requires the knowledge of the fundamental solid state physics and physical technologies.

Co-requisites

Not applicable.

Planned learning activities and teaching methods

The course is taught through practical laboratory work.

Assesment methods and criteria linked to learning outcomes

Completion of the course is conditional on having attended all exercises according to the schedule and submitted all reports in at least sufficient quality. The course classification reflects the assessment of the reports, the quality of preparation and of laboratory works.

Course curriculum

Not applicable.

Work placements

Not applicable.

Aims

The goal of the first option of the course is to teach students the basic methods of the optical measurement including the measurement of optical elements and to familiarise students practically with the implementation and accuracy of interference, diffraction and microscopic methods.
The goal of the course in its second option is to familiarise students with the fundamentals and realisation of the basic measurements in the field of surface and thin film physics.

Specification of controlled education, way of implementation and compensation for absences

Completion of all exercises specified in the selected course option according to the instructions of the tutors is obligatory.

Recommended optional programme components

Not applicable.

Prerequisites and corequisites

Not applicable.

Basic literature

Born, M., Wolf, E.: Principles of Optics. Cambridge University Press, Cambridge 1999.
Eckertová, L.: Physics of Thin Films
Luth, H.: Surfaces and Interfaces of Solids
Reynolds, G. O., DeVelis, J. B., Parrent G. B., Thompson B. J.: The New Physical Optics Notebook

Recommended reading

Feldman, L. C., Mayer J. W.: Fundamentals of Surface and Thin Film Analysis
Fuka J., Havelka B.: I. Optika
Schroeder, G.: Technická optika

Classification of course in study plans

  • Programme N-FIN-P Master's 1 year of study, winter semester, compulsory

Type of course unit

 

Laboratory exercise

39 hod., compulsory

Teacher / Lecturer

Ing. Michal Urbánek, Ph.D.
prof. RNDr. Radim Chmelík, Ph.D.
Ing. Martin Antoš, Ph.D.
prof. RNDr. Miloslav Ohlídal, CSc.
Ing. David Prochazka, Ph.D.

Syllabus

Course Curriculum is formed by particular exercises which are completed according to instructions of the respective teachers.

Exercises in the first option of the course:
measurement of angles of optical prisms, wedges, and planparalel plates by means of the ray optics, precise measurements of angles of optical elements by interference methods, refractive index measurement, laser-induced breakdown spectroscopy - LIBS, optical profilometry - surface-topography measurement, Fresnel diffraction, Fraunhofer diffraction, confocal microscopy, holographic microscopy.

Exercises in the second option of the course:
elementary processes in plasma - proof of the Paschen law, plasma decay, optical reflective spectroscopy, ellipsometry, etching and deposition of thin films using ion beams, mass spectroscopy - RGA and SIMS, photoelectron spectroscopy - XPS, microscopy STM and AFM, low energy electron diffraction - LEED, electron microscopy.