Course detail

Photochemistry

FCH-DCO_NADAcad. year: 2020/2021

Sources of photochemically acive radiation, radiant flux measurement, Negative photoresists: photochemical processes by photoinduced crosslinking, Physical chemistry of crosslinking, Gel-point and resist sensitivity. Quantum yield of crosslinking. Photoinitiated polymerization. Radical generation, photofragmentation, hydrogen abstraction, photoinitiated cationic polymerization. Positive photoresists, photochemical transformation of diazonaphtochinons. Positive photoresists for UV-B region. Photoresist sensitometry.

Language of instruction

Czech

Mode of study

Not applicable.

Guarantor

prof. Ing. Michal Veselý, CSc.

Department

Institute of Physical and Applied Chemistry (ÚFSCH)

Learning outcomes of the course unit

Advanced knowledge of photochemistry and photophysics, photochemical reactions of organic and macromolecular compounds, polymer imaging systems and photopolymerizable systems and their use.

Prerequisites

Photochemistry, physical chemistry

Co-requisites

Not applicable.

Planned learning activities and teaching methods

The course uses teaching methods in form of individual consultation. The e-learning system (LMS Moodle) is available to teachers and students.

Assesment methods and criteria linked to learning outcomes

Oral exam

Course curriculum

1. Sources of photochemically acive radiation, radiant flux measurement,
2. Negative photoresists: photochemical processes by photoinduced crosslinking,
3. Physical chemistry of crosslinking, Gel-point and resist sensitivity. Quantum yield of crosslinking.
4. Photoinitiated polymerization. Radical generation, photofragmentation, hydrogen abstraction, photoinitiated cationic polymerization.
5. Positive photoresists, photochemical transformation of diazonaphtochinons. Positive photoresists for UV-B region. Photoresist sensitometry.

Work placements

Not applicable.

Aims

The aim of this course is to provide students with advanced photochemical technologies.

Specification of controlled education, way of implementation and compensation for absences

none

Recommended optional programme components

Not applicable.

Prerequisites and corequisites

Not applicable.

Basic literature

REISER, A. Photoreactive Polymers: The Science and Technology of Resists. (EN)
ŠÍMA, J., ČEPPAN, M., JANČOVIČOVÁ, V., VELIČ, D. Fotochémia. 1. vyd. STU Bratislava, 2011 (SK)

Recommended reading

LAPČÍK, L., PELIKÁN P., ČEPPAN, M. Fotochemické procesy. 1. vyd. Alfa Bratislava, 1987 (SK)

Classification of course in study plans

  • Programme DKAP_FCH_4 Doctoral

    branch DKAO_FCH , 1 year of study, winter semester, compulsory-optional

  • Programme DKCP_FCH_4 Doctoral

    branch DKCPO_FCH_4 , 1 year of study, winter semester, compulsory-optional

  • Programme DPAP_FCH_4 Doctoral

    branch DPAO_FCH , 1 year of study, winter semester, compulsory-optional

  • Programme DPCP_FCH_4 Doctoral

    branch DPCPO_FCH_4 , 1 year of study, winter semester, compulsory-optional