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FSI-9ANCAcad. year: 2020/2021
The course gives a basic overview about electron and ion optical devices for microscopy and lithography. The students obtain a basic overview of charged particle optics (equation of motion, trajectory equation, aberrations in the image, determination of electromagnetic fields used particle optics and their properties, the effects of mutual interactions of particles in the beam). The sources of electron and ion beams are briefly characterized as well as the problems of generation of image and image resolution in microscopy. Finally analytical methods used in microscopy are dealt with (energy and mass spectrometers, X-ray analysis).
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Specification of controlled education, way of implementation and compensation for absences
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branch D-FMI , 1 year of study, winter semester, recommended course
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