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Course detail
FCH-MCO_TVRAcad. year: 2021/2022
Terminology; fundamentals of vacuum science; introduction to plasma physics and chemistry; film deposition techniques: vacuum evaporation, sputtering, plasma polymerization, laser-enhanced CVD, CVD processes; thin film characterization: film growth, film thickness and deposition rate, scanning probe microscopy (STM, AFM, EFM, MFM, SNOM), mechanical properties (measurement techniques, internal stress, adhesion).
Language of instruction
Number of ECTS credits
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Learning outcomes of the course unit
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Planned learning activities and teaching methods
Assesment methods and criteria linked to learning outcomes
Course curriculum
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Aims
Specification of controlled education, way of implementation and compensation for absences
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Prerequisites and corequisites
Basic literature
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Elearning
Classification of course in study plans
branch NPCO_CHM , 2 year of study, winter semester, compulsory-optional
branch NKCO_CHM , 2 year of study, winter semester, compulsory-optional
Lecture
Teacher / Lecturer
Guided consultation in combined form of studies