Lecture 1 - Introduction to low-dimensional structures, bottom-up and self-assembly. General introduction, quantum dots, fullerenes, nanowires, 2D materials, chemical approaches to growth, physical approaches to growth, self-assembly

Lecture 2 - Top-down technology, Hybrid approaches. SPM-based lithography, Resist based technology (optical and electron beam lithography), hybrid approaches to assembly)

Lecture 3 - Magnetron/Ion Beam sputtering, evaporation and spintronics. Different thin film growth strategies, ranging from evaporation to sputtering techniques. Epitaxial films and heterostructures. Semiconductor multilayer structures and magnetic recording media.

Lecture 4 - Molecular beam epitaxy. Molecular beam epitaxy will be explained with emphasis on applications in solid state lasers

Lecture 5 - Etching and Chemical Vapor Deposition. Wet and dry etching will be briefly discussed. Chemical Vapor Deposition will be explained, including doping in nanostructures and blue diode story.

Lecture 6 - Atomic Layer Deposition. The lecture will provide a brief overview of technology used in semiconductor industry. Most important technological landmarks will be introduced, with emphasis on Atomic Layer Deposition.

Lecture 7 - Focused Particle Beam enhanced lithography. Interactions of primary ions with condensed matter, focused ion beam system technology, micro- and nanofabrication, focused ion beam induced processes and general and special applications of FIB

Lecture 8 - Composition and structure of low dimensional structures. A general overview on the structural and composition analysis tools of thin films and nanostructures will be given, including x-ray diffraction, spectroscopic ellipsometry, SEM/TEM, and surface science analytical techniques with high spatial resolution.

The calculation of supportive theoretical examples and practical demonstrations and testing take place during the whole semester.