Course detail

Plasma Chemistry

FCH-MC_PLAAcad. year: 2023/2024

This course is focused on basic properties and processes taking place in plasma, including their diagnostics and possible applications. Students are introduced to plasma thermodynamics and kinetics (non-equilibrium and equilibrium plasma, collision processes, distribution functions, basic transport processes in plasma). Lectures also provide a list of basic methods of plasma diagnostics (spectral, probe, and corpuscular methods). The main part of the course deals with plasma in labs, its properties, particular types of electrical discharges, its generation and possible applications (dc, ac, RF, MW, discharges in liquids, plasma excited at high pressure, capacitive and inductive coupled plasma). A list of plasma chemical processes contains especially reactions in active and post-discharge plasma, surface treatment of various materials, creation of thin layers (PE CVD, PA CVD), plasma polymerization, plasma spraying, sputtering, and etching. Moreover, lasers, plasma displays, eletric arc, electric beam, and plasmas as illumination tools belong to special ideal as well as non-ideal plasma kinds using assisted chemical reactions.

Language of instruction

Czech

Number of ECTS credits

4

Mode of study

Not applicable.

Entry knowledge

Physical chemistry - thermodynamics, kinetics.
Physics - mass point motion, electric field and current, magnetic field
Mathematics - differential equations

Rules for evaluation and completion of the course

Written examination. It consists of ten questions scored by points; maximal point achievement is 100, limit to pass is 50 points.
none

Aims

The course of Plasma Chemistry is focused on fundamental properties of plasma state and present methodology of plasma chemistry in order to let students apply the unique physical characteristics of plasma to the fields such as material science, microelectronics, biology, and polymer, organic, inorganic and analytical chemistry.
Passing the course provides students knowledge of plasma fundamental, principles of plasma generation and its diagnostics and present technology of plasma chemistry.

Study aids

Not applicable.

Prerequisites and corequisites

Not applicable.

Basic literature

Chen F. F. / Rohlena K.: Úvod do fyziky plazmatu. ACADEMIA, Praha 1984 (CS)
Janča J., Kudrle V., Eliáš M., Zajíčková Z.: Fyzika plazmatu I. Masarykova Univerzita, Brno 2003 (CS)

Recommended reading

Chen F., Chang J. P.: Principles of Plasma Processing. Kluwer Academic, Plenum Publishers, NewYork 2003. (EN)
Kulhánek P.: Teorie plazmatu. ČVUT, Praha 2008 (CS)
Roth J. R.: Industrial Plasma Engineering Volume 1: Principles. Institute of Physics Publishing, Bristol and Philadelphia 1995. (EN)
Roth J. R.: Industrial Plasma Engineering Volume 2: Applications to Nonthermal Plasma Processing. Institute of Physics Publishing, Bristol and Philadelphia 2001. (EN)

Elearning

Classification of course in study plans

  • Programme NPCP_CHCHTE Master's 1 year of study, summer semester, compulsory
  • Programme NKCP_CHCHTE Master's 1 year of study, summer semester, compulsory

Type of course unit

 

Lecture

26 hod., optionally

Teacher / Lecturer

Syllabus

1. Plasma definition, ideal plasma conditions, types of plasma
2. Basic collision processes, cross section, collision frequency
3. Plasma kinetic theory, Boltzmann kinetic equation, velocity distribution functions
4. Physical plasma properties
5. Laboratory plasma breakdown conditions in gases, Townsend´s theory of electron avalanches, Paschen´s law
6. Laboratory plasma: electric discharges in gases and liquids
7. Plasma diagnostics: spectral and optical methods
8. Plasma diagnostics: probe and corpuscular methods
9. Introduction to plasma chemistry, conditions for realization of plasma-chemical reactions, reactions in non-equilibrium chemical kinetics, kinetics of plasma-chemical reactions
10. Plasma polymerisation, surface treatment of synthetic and natural materials
11. Selected plasma-chemical technologies: plasma etching, sputtering and spraying, thin film deposition (PE CVD, PA CVD)
12. Special kinds of plasma with participation of chemical reactions: illumination techniques, plasma displays, chemical lasers
13. Electric arc, electron beam processing

Guided consultation in combined form of studies

26 hod., optionally

Teacher / Lecturer

Elearning