Course detail

Laboratory Classes in Photochemistry

FCH-MC_FCP_PAcad. year: 2024/2025

Practical tasks on topics: The photocatalytic processes, actinometry, positive & negative photoresists, photopolymerization. Evaluation of obtained results.

Language of instruction

Czech

Number of ECTS credits

3

Mode of study

Not applicable.

Guarantor

prof. Ing. Michal Veselý, CSc.

Department

Institute of Physical and Applied Chemistry (ÚFSCH)

Entry knowledge

photochemistry

Rules for evaluation and completion of the course

Graded course-unit credit
Attendance and activity at the laboratory classes are required. One absence can be compensated by the elaboration of substitute tasks.

Aims

The aim of the Laboratory classes in photochemical processes is to provide them practical training of photochemical reactions and their applications in technologies and other fields.
The students will obtain practical knowledge of photochemical reactions of organic compounds, photocatalysis, actinometry, photoresists preparation and processing.

Study aids

Not applicable.

Prerequisites and corequisites

Not applicable.

Basic literature

Not applicable.

Recommended reading

Not applicable.

Classification of course in study plans

  • Programme NKCP_CHCHTE Master's 1 year of study, summer semester, compulsory-optional
  • Programme NPCP_CHCHTE Master's 1 year of study, summer semester, compulsory-optional

Type of course unit

 

Guided consultation in combined form of studies

26 hod., optionally

Teacher / Lecturer

prof. Ing. Michal Veselý, CSc.

Laboratory exercise

39 hod., compulsory

Teacher / Lecturer

prof. Ing. Michal Veselý, CSc.

Syllabus

1. The photocatalytic processes: photocatalytic degradation of 2,6-dichlorindophenol.
2. The photocatalytic processes: photocatalytic reduction of silver from aqueous solution.
3. The actinometry: determination of incident radiant flux using optical bench.
4. The positive photoresists: determination of right exposure condition for photopolymer printing form.
5. The positive photoresists: speed determination of conventional offset printing plate.
6. The negative photoresists: preparation of light-sensitive composition, its speed determination. Effect of concentration of light-sensitive compound.
7. The negative photoresists: preparation of light-sensitive composition, its speed determination. Effect of layer thickness.