Course detail

Preparation and Properties of Thin Layers of Materials

FCH-DA_PTVAcad. year: 2024/2025

Terminology; fundamentals of vacuum science; introduction to plasma physics and chemistry; film deposition techniques: vacuum evaporation, sputtering, plasma polymerization, mass spektrometry, laser-enhanced CVD, CVD processes; thin film characterization: film growth, film thickness and deposition rate, scanning probe microscopy (STM, AFM, EFM, MFM, SNOM), mechanical properties (measurement techniques, internal stress, adhesion), spectroscopic ellipsometry and analytical methods (XPS, RBS, ERDA, FTIR).

Language of instruction

English

Mode of study

Not applicable.

Entry knowledge

Not applicable.

Rules for evaluation and completion of the course

Not applicable.

Aims

Not applicable.

Study aids

Not applicable.

Prerequisites and corequisites

Not applicable.

Basic literature

D. Hoffman, B. Singh, J.H. Thomas, Handbook of Vacuum Science and Technology, Academic Press 1998. (EN)
H. Bubert, H. Jenett, Surface and Thin Film Analysis, Wiley-VCH, 2002 (EN)
M. Ohring, Materials Science of Thin Films, Academic Press 2002. (EN)
V. L. Mironov, Fundamentals of Scanning Probe Microscopy, NT-MDT 2004. (EN)

Recommended reading

Not applicable.

Classification of course in study plans

  • Programme DKAP_CHM_4_N Doctoral 1 year of study, winter semester, compulsory-optional
  • Programme DPAP_CHM_4_N Doctoral 1 year of study, winter semester, compulsory-optional