Course detail

Thin Films

FCH-MC_TVRAcad. year: 2025/2026

Terminology; fundamentals of vacuum science; introduction to plasma physics and chemistry; film deposition techniques: vacuum evaporation, sputtering, plasma polymerization, laser-enhanced CVD, CVD processes; thin film characterization: film growth, film thickness and deposition rate, scanning probe microscopy (STM, AFM, EFM, MFM, SNOM), mechanical properties (measurement techniques, internal stress, adhesion).

Language of instruction

Czech

Number of ECTS credits

3

Mode of study

Not applicable.

Guarantor

prof. RNDr. Vladimír Čech, Ph.D.

Department

Institute of Materials Science (ÚCHM)

Entry knowledge

Basic chemistry and physics.

Rules for evaluation and completion of the course

Entrance written test and oral exam are aimed at basic knowledge about thin film technologies and thin film characterization.
Participation at lectures is not mandatory.

Aims

Knowledge about advanced technologies and analyses of thin films is the aims of this subject.
Students acquire basic knowledge about thin-film technology, characterization and application. They can use this knowledge in their diploma thesis and later as technologists and researchers.

Study aids

Not applicable.

Prerequisites and corequisites

Not applicable.

Basic literature

D. Hoffman, B. Singh, J.H. Thomas, Handbook of Vacuum Science and Technology, Academic Press 1998 (CS)
L. Eckertová, Fyzika tenkých vrstev, SNTL 1973 (CS)
M. Ohring, Materials Science of Thin Films, Academic Press 2002 (CS)
V. L. Mironov, Fundamentals of Scanning Probe Microscopy, NT-MDT 2004 (CS)

Recommended reading

Not applicable.

Classification of course in study plans

  • Programme NPCP_CHTM Master's 2 year of study, winter semester, compulsory-optional
  • Programme NKCP_CHTM Master's 2 year of study, winter semester, compulsory-optional

Type of course unit

 

Lecture

26 hod., optionally

Teacher / Lecturer

prof. RNDr. Vladimír Čech, Ph.D.

Syllabus

1. Introduction / information sources
2. Fundamentals of vacuum science
3. Introduction to plasma physics and chemistry
4. Physical vapor deposition
5. Chemical vapor deposition
6. Plasma-enhanced chemical vapor deposition
7. Film growth
8. Film thickness measurement
9. Scanning probe microscopy
10. Mechanical properties
11. Case study
12. Case study
13. Written test, visit to laboratories

Guided consultation in combined form of studies

26 hod., optionally

Teacher / Lecturer

prof. RNDr. Vladimír Čech, Ph.D.