angličtina

Terminology; fundamentals of vacuum science; introduction to plasma physics and chemistry; film deposition techniques: vacuum evaporation, sputtering, plasma polymerization, mass spektrometry, laser-enhanced CVD, CVD processes; thin film characterization: film growth, film thickness and deposition rate, scanning probe microscopy (STM, AFM, EFM, MFM, SNOM), mechanical properties (measurement techniques, internal stress, adhesion), spectroscopic ellipsometry and analytical methods (XPS, RBS, ERDA, FTIR).

Introduction / information sources
Fundamentals of vacuum science
Introduction to plasma physics and chemistry
Physical vapor deposition
Chemical vapor deposition
Plasma-enhanced chemical vapor deposition
Mass spectrometry
Film growth
Film thickness
Scanning probe microscopy
Mechanical properties
Spectroscopic ellipsometry
X-ray photoelectron spectroscopy (XPS)
Rutherford Backscattering Spectrometry (RBS):
Elastic Recoil Detection Analysis (ERDA):
Fourier Transform Infrared Spectroscopy (FTIR):
Case study

D. Hoffman, B. Singh, J.H. Thomas, Handbook of Vacuum Science and Technology, Academic Press 1998. (EN)
H. Bubert, H. Jenett, Surface and Thin Film Analysis, Wiley-VCH, 2002 (EN)
M. Ohring, Materials Science of Thin Films, Academic Press 2002. (EN)
V. L. Mironov, Fundamentals of Scanning Probe Microscopy, NT-MDT 2004. (EN)