Detail publikace

Plasma Enhanced Chemical Vapour Deposition of SiO2-Like Films: Monitoring and Optimization of the Process

PROCHÁZKA, M. BLAHOVÁ, L. KRČMA, F. PŘIKRYL, R.

Originální název

Plasma Enhanced Chemical Vapour Deposition of SiO2-Like Films: Monitoring and Optimization of the Process

Typ

abstrakt

Jazyk

angličtina

Originální abstrakt

This work focuses on high density thin films deposited by PECVD using hexamethyldisiloxane precursor. Optical emission spectroscopy was used for plasma diagnostics. Oxygen transmission rate and infrared spectra of deposited layers were measured. Optimal experimental conditions for low carbon content layers and layers with good barrier properties were determined.

Klíčová slova

Thin film deposition, optical emission spectroscopy, oxygen transmission rate

Autoři

PROCHÁZKA, M.; BLAHOVÁ, L.; KRČMA, F.; PŘIKRYL, R.

Vydáno

7. 12. 2012

Nakladatel

FCH VUT

Místo

Brno

ISBN

978-80-214-4545-8

Kniha

Studentská konference Chemie je život – Sborník abstraktů

Strany od

120

Strany do

120

Strany počet

1

BibTex

@misc{BUT101784,
  author="Michal {Procházka} and Lucie {Janů} and František {Krčma} and Radek {Přikryl}",
  title="Plasma Enhanced Chemical Vapour Deposition of SiO2-Like Films: Monitoring and Optimization of the Process",
  booktitle="Studentská konference Chemie je život – Sborník abstraktů",
  year="2012",
  pages="120--120",
  publisher="FCH VUT",
  address="Brno",
  isbn="978-80-214-4545-8",
  note="abstract"
}