Přístupnostní navigace
E-přihláška
Vyhledávání Vyhledat Zavřít
Detail publikace
DALLAEVA, D. TALU, S. STACH, S. ŠKARVADA, P. TOMÁNEK, P. GRMELA, L.
Originální název
AFM imaging and fractal analysis of surface roughness of AlN epilayers on sapphire substrates
Typ
článek v časopise ve Web of Science, Jimp
Jazyk
angličtina
Originální abstrakt
The paper deals with AFM imaging and characterization of 3D surface morphology of aluminum nitride (AlN) epilayers on sapphire substrates prepared by magnetron sputtering. Due to the effect of temperature changes on epilayer's surface during the fabrication, a surface morphology is studied by combination of atomic force microscopy (AFM) and fractal analysis methods. Both methods are useful tools that may assist manufacturers in developing and fabricating AlN thin films with optimal surface characteristics. Furthermore, they provide different yet complementary information to that offered by traditional surface statistical parameters. This combination is used for the first time for measurement on AlN epilayers on sapphire substrates, and provides the overall 3D morphology of the sample surfaces (by AFM imaging), and reveals fractal characteristics in the surface morphology (fractal analysis).
Klíčová slova
Aluminum nitride; Epitaxy; Substrate; Surface roughness; Atomic force microscopy; Fractal analysis
Autoři
DALLAEVA, D.; TALU, S.; STACH, S.; ŠKARVADA, P.; TOMÁNEK, P.; GRMELA, L.
Rok RIV
2014
Vydáno
1. 9. 2014
Nakladatel
Elsevier
ISSN
0169-4332
Periodikum
Applied Surface Science
Ročník
312
Číslo
Stát
Nizozemsko
Strany od
81
Strany do
86
Strany počet
6
BibTex
@article{BUT108712, author="Dinara {Sobola} and Stefan {Talu} and Sebastian {Stach} and Pavel {Škarvada} and Pavel {Tománek} and Lubomír {Grmela}", title="AFM imaging and fractal analysis of surface roughness of AlN epilayers on sapphire substrates", journal="Applied Surface Science", year="2014", volume="312", number="312", pages="81--86", doi="10.1016/j.apsusc.2014.05.086", issn="0169-4332" }