Detail publikace

INFLUENCE OF ELECTRON ATTACHMENT ON KINETIC COMPOSITION OF SF6-ARC PLASMA

BARTLOVÁ, M., COUFAL, O.

Originální název

INFLUENCE OF ELECTRON ATTACHMENT ON KINETIC COMPOSITION OF SF6-ARC PLASMA

Typ

článek ve sborníku ve WoS nebo Scopus

Jazyk

angličtina

Originální abstrakt

SF6 is considered as one of the best quenching media in HV circuit breakers. To obtain optimum properties of the extinction process, mathematical modeling is employed. This approach necessitates good knowledge of the properties of SF6 which are determined by properties of products of its dissociation and ionization. In order to investigate an SF6 circuit breaker arc during extinction process the composition has to be computed by means of chemical kinetics. There are a lot of chemical reactions among species in the dissociated SF6 system. In our previous model of chemical kinetics we have not taken into account reactions of electron attachment. This process is important for reduction of the concentration of free electrons in the system which influences the breaking capacity of the circuit breaker. In this paper we have improved our previous model by reactions of electron attachment to SF6, F2, and F and compared results of both models.

Klíčová slova

SF6-arc plasma, kinetic composition, electron attachment

Autoři

BARTLOVÁ, M., COUFAL, O.

Rok RIV

2004

Vydáno

10. 11. 2004

Nakladatel

FEEC, Brno University of Technology

Místo

Brno

ISBN

80-7355-024-5

Kniha

New Trends in Physics, Proc. of the conference

Strany od

156

Strany do

159

Strany počet

4

BibTex

@inproceedings{BUT11821,
  author="Milada {Bartlová} and Oldřich {Coufal}",
  title="INFLUENCE OF ELECTRON ATTACHMENT ON KINETIC COMPOSITION OF SF6-ARC PLASMA",
  booktitle="New Trends in Physics, Proc. of the conference",
  year="2004",
  pages="4",
  publisher="FEEC, Brno University of Technology",
  address="Brno",
  isbn="80-7355-024-5"
}