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HOFMAN, J. HÁZE, J. JAKSIC, A. SHARP, R. VASOVIC, N.
Originální název
In-situ measurement of total ionising dose induced changes in threshold voltage and temperature coefficients of RADFETs
Typ
článek v časopise ve Web of Science, Jimp
Jazyk
angličtina
Originální abstrakt
This work presents results of a total ionising dose experiment, during which p-channel RADFETs were irradiated and measured under different gate bias conditions using an in-situ technique. The measurement system allowed threshold voltage shifts and temperature sensitivity of the shift to be measured during irradiation to 60 krad(Si) and the subsequent 55 day period of annealing. The experimental results obtained allow improved insight into temperature sensitivity related problems of RADFET based dosimetry systems for space and terrestrial applications. The results show that the radiation-induced decrease in mobility, caused by the interface trap build-up, has a predominant effect on RADFET temperature coefficients.
Klíčová slova
RADFET, PMOS dosimeter, temperature effects, temperature coefficient, MTC, ZTC, automated test equipment, test methods.
Autoři
HOFMAN, J.; HÁZE, J.; JAKSIC, A.; SHARP, R.; VASOVIC, N.
Vydáno
17. 11. 2016
Nakladatel
IEEE periodicals
Místo
Piscatawy, NJ 08854 USA
ISSN
0018-9499
Periodikum
IEEE TRANSACTIONS ON NUCLEAR SCIENCE
Ročník
PP
Číslo
99
Stát
Spojené státy americké
Strany od
1
Strany do
5
Strany počet
URL
http://ieeexplore.ieee.org/document/7747503/
BibTex
@article{BUT130481, author="Jiří {Hofman} and Jiří {Háze} and Aleksandar {Jaksic} and Richard {Sharp} and Nikola {Vasovic}", title="In-situ measurement of total ionising dose induced changes in threshold voltage and temperature coefficients of RADFETs", journal="IEEE TRANSACTIONS ON NUCLEAR SCIENCE", year="2016", volume="PP", number="99", pages="1--5", doi="10.1109/TNS.2016.2630275", issn="0018-9499", url="http://ieeexplore.ieee.org/document/7747503/" }