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PAPEŽ, N. SOBOLA, D. GAJDOŠ, A. ŠKVARENINA, Ľ. MACKŮ, R. ELIÁŠ, M. NEBOJSA, A. MOTÚZ, R.
Originální název
Surface morphology after reactive ion etching of silicon and gallium arsenide based solar cells
Typ
článek v časopise ve Scopus, Jsc
Jazyk
angličtina
Originální abstrakt
This work aims to study the surface morphology of solar cells before and after reactive ion etching (RIE) at two different pressures. Two types of solar cell based on GaAs and polycrystalline Si were processed and compared. The Scanning Electron Microscope (SEM) with the Energy Dispersive X-ray spectroscopy (EDX) was used for analysis of the samples. Raman spectroscopy showed a structural fingerprint of materials before and after processing. Atomic Force Microscope (AFM) demonstrated dimensional topography with high resolution. Optical spectrometer detected changing of reflectance the samples. Experimentally, it has been confirmed that GaAs solar cells have a very high endurance to ion bombardment in comparison to Si cells.
Klíčová slova
gallium arsenide, ion etching, rie, silicon, afm
Autoři
PAPEŽ, N.; SOBOLA, D.; GAJDOŠ, A.; ŠKVARENINA, Ľ.; MACKŮ, R.; ELIÁŠ, M.; NEBOJSA, A.; MOTÚZ, R.
Vydáno
1. 12. 2018
Nakladatel
IOP Publishing Ltd
ISSN
1742-6596
Periodikum
Journal of Physics: Conference Series
Ročník
1124
Číslo
4
Stát
Spojené království Velké Británie a Severního Irska
Strany od
165
Strany do
171
Strany počet
6
URL
http://iopscience.iop.org/article/10.1088/1742-6596/1124/4/041015
BibTex
@article{BUT151859, author="Nikola {Papež} and Dinara {Sobola} and Adam {Gajdoš} and Ľubomír {Škvarenina} and Robert {Macků} and Marek {Eliáš} and Alois {Nebojsa} and Rastislav {Motúz}", title="Surface morphology after reactive ion etching of silicon and gallium arsenide based solar cells", journal="Journal of Physics: Conference Series", year="2018", volume="1124", number="4", pages="165--171", doi="10.1088/1742-6596/1124/4/041015", issn="1742-6596", url="http://iopscience.iop.org/article/10.1088/1742-6596/1124/4/041015" }