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PROKEŠ, T. MOURALOVÁ, K. ZAHRADNÍČEK, R. BEDNÁŘ, J. KALIVODA, M.
Originální název
Optimization of Deposition Parameters of a DLC Layer Using (RF) PECVD Technology
Typ
kapitola v knize
Jazyk
angličtina
Originální abstrakt
The aim of this study was to carry out a planned experiment (DoE) in order to find a suitable combination of deposition parameters to increase the hardness of the coating. In a 20-round experiment, parameters of chamber pressure, gas flow and the power of an RF source were gradually changed. Subsequently, a micro hardness analysis was carried out using the Berkovich method. Using the DoE method, a combination of parameters was detected within which a comparable hardness of the coating was achieved as with doping of the hydrogen atoms coating to increase the number of Sp3 carbon bonds. Within the indentation test, a scratch test was carried out to determine the normal force required to break the coating.
Klíčová slova
DLC, RF PECVD, Coating hardness, scrath test, DoE, Berkovich
Autoři
PROKEŠ, T.; MOURALOVÁ, K.; ZAHRADNÍČEK, R.; BEDNÁŘ, J.; KALIVODA, M.
Vydáno
11. 3. 2021
Nakladatel
Springer International Publishing
Místo
Švýcarsko
ISBN
978-3-030-61659-5
Kniha
Recent Advances in Soft Computing and Cybernetics
ISSN
1434-9922
Periodikum
Studies in Fuzziness and Soft Computing
Ročník
2021
Číslo
403
Stát
neuvedeno
Strany od
53
Strany do
62
Strany počet
10
URL
https://link.springer.com/chapter/10.1007/978-3-030-61659-5_5
BibTex
@inbook{BUT157677, author="Tomáš {Prokeš} and Kateřina {Mouralová} and Radim {Zahradníček} and Josef {Bednář} and Milan {Kalivoda}", title="Optimization of Deposition Parameters of a DLC Layer Using (RF) PECVD Technology", booktitle="Recent Advances in Soft Computing and Cybernetics", year="2021", publisher="Springer International Publishing", address="Švýcarsko", pages="53--62", doi="10.1007/978-3-030-61659-5\{_}5https://link.springer.com/chapter/10.1007/978-3-030-61659-5\{_}5", isbn="978-3-030-61659-5", url="https://link.springer.com/chapter/10.1007/978-3-030-61659-5_5" }