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STUDÝNKA, J., ČECH, V., PŘIKRYL, R.
Originální název
Basic diagnostics of glow discharge using tetravinylsilane monomer
Typ
článek ve sborníku ve WoS nebo Scopus
Jazyk
angličtina
Originální abstrakt
Plasma-Enhanced Chemical Vapor Deposition (PE CVD) is a suitable technique for preparation of thin films on a basis of organosilicones [1,2]. The technique enables reproducible deposition of plasma polymer films with desired physico-chemical properties [3] by changing the deposition conditions (power, monomer flow rate, pressure). Tetravinylsilane (TVS) was used as a monomer for deposition of pp-TVS films for the first time. The symmetric molecule was tested in order to observe an influence of deposition conditions on the vinyl content in pp-TVS films during our study. The helical coupling system [4] was applied to deposit single films using an RF glow discharge operated in pulsed mode. The plasma was monitored by mass spectroscopy and photodiode with respect to the duty cycle (0.001 - 0.5) and period (2 - 1000 ms) of pulsed regime, monomer flow rate (0.05 - 0.62 sccm), pressure (0.1 - 4.4 Pa), and effective power (0.05 - 25 W).
Klíčová slova
plasma, glow discharge; mass spectroscopy
Autoři
Rok RIV
2005
Vydáno
20. 9. 2005
Místo
Brno
Strany od
1
Strany do
4
Strany počet
BibTex
@inproceedings{BUT16051, author="Jan {Studýnka} and Radek {Přikryl} and Vladimír {Čech}", title="Basic diagnostics of glow discharge using tetravinylsilane monomer", booktitle="Juniormat 05", year="2005", pages="1--4", address="Brno" }