Metody pasivace povrchů fotovoltaických solárních článků.

Methods of photovoltaic solar cells surface passivation.

článek ve sborníku ve WoS nebo Scopus

čeština

When talking about surface passivation techniques of photovoltaic solar cells silicon nitrid (SiN) is the most widely used material. One important feature of this is the thermal stability during the deposition. Another improvement of this parameter is possible by utilization of own substrate on which the SiO2 layer is created. Two methods of surface passivation will be described in this article. The first Plasma-Enhanced Chemical-Vapour Deposition system used for SiN deposition and the second creating thermally grown oxid on Si surface will be disscussed. There will be shown that very good thermal stability is possible by combination of both SiN and SiO2. Due to this the recombination in all the volume and on the Si surface is reduced. This leads to higher efficiency of solar cell itself.

When talking about surface passivation techniques of photovoltaic solar cells silicon nitrid (SiN) is the most widely used material. One important feature of this is the thermal stability during the deposition. Another improvement of this parameter is possible by utilization of own substrate on which the SiO2 layer is created. Two methods of surface passivation will be described in this article. The first Plasma-Enhanced Chemical-Vapour Deposition system used for SiN deposition and the second creating thermally grown oxid on Si surface will be disscussed. There will be shown that very good thermal stability is possible by combination of both SiN and SiO2. Due to this the recombination in all the volume and on the Si surface is reduced. This leads to higher efficiency of solar cell itself.

passivation layers, deposition

Ondřej Hégr

2005

2. 11. 2005

Fakulta elektrotechnická, Západočeská univerzita v Plzni

Plzeň

80-7043-375-2

Elektrotechnika a informatika 2005

11

14

4