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SHAKOURY, R. TALEBANI, N. ZELATI, A. TALU, S. ARMAN, A. MIRZAEI, S. JAFARI, A.
Originální název
The effect of thickness and film homogeneity on the optical and microstructures of the ZrO2 thin films prepared by electron beam evaporation method
Typ
článek v časopise ve Web of Science, Jimp
Jazyk
angličtina
Originální abstrakt
In this study, ZrO2 coatings with different thicknesses were grown by the electron beam evaporation technique. The crystalline structure was studied by XRD analysis which suggested the tetragonal and monoclinic phases for ZrO2 coatings. Additionally, the film thickness slightly enhanced the crystallinity. The surface morphology and fractal features were analyzed using Scanning Electron Microscopy (SEM). The surface statistical parameters and the fractal geometry were employed to analyze the impact of the coating thickness and homogeneity on the morphology of the films. The statistical processing and fractal dimension revealed variations in the morphology parameters due to the electron beam evaporation method applied for different thicknesses of samples. Based on these results, it can be concluded that the surface microtexture and fractal dimension area correlated with the thickness and homogeneity of the crystalline structure.
Klíčová slova
Optical absorbance; SEM; Stereometric analyses; Surface morphology; ZrO2; XRD
Autoři
SHAKOURY, R.; TALEBANI, N.; ZELATI, A.; TALU, S.; ARMAN, A.; MIRZAEI, S.; JAFARI, A.
Vydáno
1. 8. 2021
Nakladatel
SPRINGER
Místo
DORDRECHT
ISSN
1572-817X
Periodikum
Optical and Quantum Electronics
Ročník
53
Číslo
8
Stát
Nizozemsko
Strany od
441-1
Strany do
441-12
Strany počet
12
URL
https://link.springer.com/article/10.1007%2Fs11082-021-03079-4