Detail publikace

Plasma polymer films prepared in RF inductive coupling system

Čech, V., Přikryl, R., Vaněk, J.

Originální název

Plasma polymer films prepared in RF inductive coupling system

Typ

článek ve sborníku ve WoS nebo Scopus

Jazyk

angličtina

Originální abstrakt

We would like to demonstrate a possibility to deposit plasma polymer films of high reproducibility and controlled physico-chemical properties. Plasma polymer films were prepared by plasma-enhanced chemical vapor deposition (PE CVD) employing an RF helical coupling system [1] operated at continuous or pulsed regime. The effective power (Weff) of pulsed plasma was controlled by changing the ratio of the time when plasma is switched on (ton) to the time when plasma is switched off (toff), Weff = Wtotal × ton/(ton+ toff), where Wtotal= 50 W. Vinyltriethoxysilane (VTES) was used as the monomer. Thin films were deposited on silicon wafers or special microscope slides without flaws pretreated by Ar plasma (10 sccm, 10 Pa, 25 W) for 10 min. Employing a mechanical manipulator the pretreated substrate was placed into the plasma zone after plasma reached the steady state monitored by mass spectroscopy. The film thickness was measured by a Profiler Talystep (Taylor-Hobson) or a spectroscopic phase-modulated ellipsometer UVISEL (Jobin Yvon).

Klíčová slova

plasma, polymer, deposition, system

Autoři

Čech, V., Přikryl, R., Vaněk, J.

Rok RIV

2004

Vydáno

1. 1. 2004

Místo

Itálie

Strany od

65

Strany do

67

Strany počet

3

BibTex

@inproceedings{BUT17605,
  author="Vladimír {Čech} and Radek {Přikryl} and Jan {Vaněk}",
  title="Plasma polymer films prepared in RF inductive coupling system",
  booktitle="Proc. 3rd Joint Workgroup Meeting",
  year="2004",
  pages="3",
  address="Itálie"
}