Detail publikace

High-Capacitance Nanoporous Noble Metal Thin Films via Reduction of Sputtered Metal Oxides

GRYSZEL, M. JAKEŠOVÁ, M. LEDNICKÝ, T. GLOWACKI, E.

Originální název

High-Capacitance Nanoporous Noble Metal Thin Films via Reduction of Sputtered Metal Oxides

Typ

článek v časopise ve Web of Science, Jimp

Jazyk

angličtina

Originální abstrakt

Increasing the electrochemical surface area of noble metal electrodes is vital for many applications, including catalysis and bioelectronics. Herein, a method is presented for obtaining porous noble metal thin films via reactive magnetron sputtering of noble metal oxides, MOx, followed by their reduction using chemical reducers or electrochemical current. Variation of reduction conditions yields a range of different electrochemical and morphological properties. This method for obtaining porous noble metals is rapid, facile, and compatible with microfabrication processes. The resulting metallic films are porous and have competitively high capacitance and low impedance.

Klíčová slova

electrochemistry; magnetron sputtering; microelectrodes; noble metals; porous metals

Autoři

GRYSZEL, M.; JAKEŠOVÁ, M.; LEDNICKÝ, T.; GLOWACKI, E.

Vydáno

1. 2. 2022

Nakladatel

WILEY

Místo

HOBOKEN

ISSN

2196-7350

Periodikum

Advanced Materials Interfaces

Ročník

9

Číslo

5

Stát

Spolková republika Německo

Strany od

2101973-1

Strany do

2101973-6

Strany počet

6

URL

https://onlinelibrary.wiley.com/doi/10.1002/admi.202101973

Plný text v Digitální knihovně

http://hdl.handle.net/11012/209169