Detail publikace

Measurement and Optimization of an ECR Plasma Source

HAVLÍČEK, L. NEŠPOR, D. JUŘÍK, K.

Originální název

Measurement and Optimization of an ECR Plasma Source

Typ

článek ve sborníku ve WoS nebo Scopus

Jazyk

angličtina

Originální abstrakt

Electron cyclotron resonance (ECR) is a very common technique for various kinds of applications. Among others, it is widely used in the field of semiconductor or material industry, electron microscopy or plasmatic machining. This paper deals with an ECR source of plasma, which is used for ions generation. The plasma source uses the cyclotron resonance principle for Xenon gas ionization and efficient plasma generation. This technology is advantageous for selected application for several reasons, especially for a wide range of optimization options of the drive system. The used measurement methods are based on well-known information about the ion source and standard working conditions. Within this paper, we optimize the conditions to find out the best set of input parameters. The output of this experiment is a multidimensional map of the working conditions, essential to evaluate the dependences of variable working pressure, excitation energies and frequencies and to understand the consequences, arising from this complex measurement. The test environment is based on an electron microscope system, which is used for measuring and controlling all working conditions. Above that, an external high-frequency power source was used for plasma excitation. Such setup enables to set and tune all the parameters, collect measured information, and interpret them easily.

Klíčová slova

ECR, Plasma source, Scattering parameters

Autoři

HAVLÍČEK, L.; NEŠPOR, D.; JUŘÍK, K.

Vydáno

30. 12. 2021

Nakladatel

IEEE

Místo

NEW YORK

ISBN

978-1-7281-7247-7

Kniha

2021 Photonics & Electromagnetics Research Symposium (PIERS)

ISSN

1559-9450

Periodikum

Progress In Electromagnetics

Stát

Spojené státy americké

Strany od

358

Strany do

361

Strany počet

4

URL

https://ieeexplore.ieee.org/document/9694823

BibTex

@inproceedings{BUT178875,
  author="Lukáš {Havlíček} and Dušan {Nešpor} and Karel {Juřík}",
  title="Measurement and Optimization of an ECR Plasma Source",
  booktitle="2021 Photonics & Electromagnetics Research Symposium (PIERS)",
  year="2021",
  journal="Progress In Electromagnetics",
  pages="358--361",
  publisher="IEEE",
  address="NEW YORK",
  doi="10.1109/PIERS53385.2021.9694823",
  isbn="978-1-7281-7247-7",
  issn="1559-9450",
  url="https://ieeexplore.ieee.org/document/9694823"
}