Detail publikace

Stable a-CSi:H films with a wide range of modulus of elasticity and low internal stress

PLICHTA, T. ŠULC, V. OHLÍDAL, M. ČECH, V.

Originální název

Stable a-CSi:H films with a wide range of modulus of elasticity and low internal stress

Typ

článek v časopise ve Web of Science, Jimp

Jazyk

angličtina

Originální abstrakt

Amorphous hydrogenated silicon carbide (a-CSi:H) thin films were deposited by plasma-enhanced chemical vapor deposition using tetravinylsilane as organosilicon precursor. The mechanical properties of the thin films, namely the modulus of elasticity, hardness, and elastic recovery parameter, were determined by nanoindentation, as well as the internal stresses by scanning electron microscopy and optical profilometry. It was found that the modulus of elasticity increased from 10 to 137 GPa with increasing power (2–150 W) delivered to plasma, while the hardness increased from 1.5 to 14.5 GPa. This improvement in mechanical properties with increasing energy delivered to the plasma is related to greater fragmentation of the precursor which led to an increase in the crosslinking of the material network. The compressive internal stresses in the films reached low values of −0.04 to −0.2 GPa with increasing power (2–75 W) and an acceptable −0.5 GPa for 150 W. The elastic recovery parameter decreased with increasing power from 0.86 to 0.64, i.e., the thin films behaved more plasticity with increasing power. The modulus of elasticity and hardness were investigated in terms of the aging of the films for a period of 6 years when samples were stored under ambient conditions. No significant changes in these properties were observed. However, minor changes were observed in the indentation curves obtained for the 2 W and even less for the 10 W samples. Small changes were then also observed for the elastic recovery parameter, whose value for these samples partially decreased which may be related to postdeposition oxidation. No changes in internal stress values over time were observed. The wide range of mechanical properties of stable a-CSi:H films with low internal stress increases their application potential and their wide use as materials with tailored properties from polymer-like to tough material.

Klíčová slova

a-CSi:H thin films; Mechanical properties; Modulus of elasticity; Hardness; Elastic recovery parameter; Internal stress

Autoři

PLICHTA, T.; ŠULC, V.; OHLÍDAL, M.; ČECH, V.

Vydáno

25. 4. 2023

Nakladatel

Elsevier B.V.

ISSN

0257-8972

Periodikum

Surface and Coatings Technology

Ročník

2022

Číslo

129147

Stát

Švýcarská konfederace

Strany počet

13

URL

https://www.sciencedirect.com/science/article/pii/S0257897222010684?pes=vor

BibTex

@article{BUT182499,
  author="Tomáš {Plichta} and Václav {Šulc} and Miloslav {Ohlídal} and Vladimír {Čech}",
  title="Stable a-CSi:H films with a wide range of modulus of elasticity and low internal stress",
  journal="Surface and Coatings Technology",
  year="2023",
  volume="2022",
  number="129147",
  pages="13",
  doi="10.1016/j.surfcoat.2022.129147",
  issn="0257-8972",
  url="https://www.sciencedirect.com/science/article/pii/S0257897222010684?pes=vor"
}