Přístupnostní navigace
E-přihláška
Vyhledávání Vyhledat Zavřít
Detail publikace
KAMNEV, K. PYTLÍČEK, Z. BENDOVÁ, M. PRÁŠEK, J. GISPERT-GUIRADO, F. LLOBET, E. MOZALEV, A.
Originální název
The planar anodic Al2O3-ZrO2 nanocomposite capacitor dielectrics for advanced passive device integration
Typ
článek v časopise ve Web of Science, Jimp
Jazyk
angličtina
Originální abstrakt
The need for integrated passive devices (IPDs) emerges from the increasing consumer demand for electronic product miniaturization. Metal-insulator-metal (MIM) capacitors are vital components of IPD systems. Developing new materials and technologies is essential for advancing capacitor characteristics and co-integrating with other electronic passives. Here we present an innovative electrochemical technology joined with the sputter-deposition of Al and Zr layers to synthesize novel planar nanocomposite metal-oxide dielectrics consisting of ZrO2 nanorods self-embedded into the nanoporous Al2O3 matrix such that its pores are entirely filled with zirconium oxide. The technology is utilized in MIM capacitors characterized by modern surface and interface analysis techniques and electrical measurements. In the 95-480 nm thickness range, the best-achieved MIM device characteristics are the one-layer capacitance density of 112 nF center dot cm(-2), the loss tangent of 4 center dot 10(-3) at frequencies up to 1 MHz, the leakage current density of 40 pA center dot cm(-2), the breakdown field strength of up to 10 MV center dot cm(-1), the energy density of 100 J center dot cm(-3), the quadratic voltage coefficient of capacitance of 4 ppm center dot V-2, and the temperature coefficient of capacitance of 480 ppm center dot K-1 at 293-423 K at 1 MHz. The outstanding performance, stability, and tunable capacitors' characteristics allow for their application in low-pass filters, coupling/decoupling/bypass circuits, RC oscillators, energy-storage devices, ultrafast charge/discharge units, or high-precision analog-to-digital converters. The capacitor technology based on the non-porous planar anodic-oxide dielectrics complements the electrochemical conception of IPDs that combined, until now, the anodized aluminum interconnection, microresistors, and microinductors, all co-related in one system for use in portable electronic devices.
Klíčová slova
Anodizing; porous anodic alumina; Al2O3-ZrO2; nanocomposite films; MIM capacitors; dielectric; integrated passives
Autoři
KAMNEV, K.; PYTLÍČEK, Z.; BENDOVÁ, M.; PRÁŠEK, J.; GISPERT-GUIRADO, F.; LLOBET, E.; MOZALEV, A.
Vydáno
31. 12. 2023
Nakladatel
Taylor & Francis
Místo
ABINGDON
ISSN
1878-5514
Periodikum
Science and Technology of Advanced Materials
Ročník
24
Číslo
1
Stát
Japonsko
Strany od
Strany do
17
Strany počet
URL
https://www.tandfonline.com/doi/full/10.1080/14686996.2022.2162324
Plný text v Digitální knihovně
http://hdl.handle.net/11012/213606
BibTex
@article{BUT184117, author="Kirill {Kamnev} and Zdeněk {Pytlíček} and Mária {Bendová} and Jan {Prášek} and Francesc {Gispert-Guirado} and Eduard {Llobet} and Alexander {Mozalev}", title="The planar anodic Al2O3-ZrO2 nanocomposite capacitor dielectrics for advanced passive device integration", journal="Science and Technology of Advanced Materials", year="2023", volume="24", number="1", pages="17", doi="10.1080/14686996.2022.2162324", issn="1878-5514", url="https://www.tandfonline.com/doi/full/10.1080/14686996.2022.2162324" }