Detail publikace

Low-Temperature Atomic Layer Deposition Synthesis of Vanadium Sulfide (Ultra)Thin Films for Nanotubular Supercapacitors

ZAZPE, R. SEPÚLVEDA SEPÚLVEDA, L. RODRIGUEZ PEREIRA, J. HROMÁDKO, L. MICHALIČKA, J. KOLÍBALOVÁ, E. KURKA, M. THALLURI, S. SOPHA, H. MACÁK, J.

Originální název

Low-Temperature Atomic Layer Deposition Synthesis of Vanadium Sulfide (Ultra)Thin Films for Nanotubular Supercapacitors

Typ

článek v časopise ve Web of Science, Jimp

Jazyk

angličtina

Originální abstrakt

Herein, the synthesis of vanadium sulfide (VxSy) by atomic layer deposition (ALD) based on the use of tetrakis(dimethylamino) vanadium (IV) and hydrogen sulfide is presented for the first time. The (ultra)thin films VxSy are synthesized in a wide range of temperatures (100-225 degrees C) and extensively characterized by different methods. The chemical composition of the VxSy (ultra)thin films reveals different vanadium oxidation states and sulfur-based species. Extensive X-ray photoelectron spectroscopy analysis studies the effect of different ALD parameters on the VxSy chemical composition. Encouraged by the rich chemistry properties of vanadium-based compounds and based on the variable valences of vanadium, the electrochemical properties of ALD VxSy (ultra)thin films as electrode material for supercapacitors are further explored. Thereby, nanotubular composites are fabricated by coating TiO2 nanotube layers (TNTs) with different numbers of VxSy ALD cycles at low temperature (100 degrees C). Long-term cycling tests reveal a gradual decline of electrochemical performance due to the progressive VxSy thin films dissolution under the experimental conditions. Nevertheless, VxSy-coated TNTs exhibit significantly superior capacitance properties as compared to the blank counterparts. The enhanced capacitance properties exhibited are derived from the presence of chemically stable and electrochemically active S-based species on the TNTs surface.

Klíčová slova

(ultra)thin films; atomic layer deposition; nanotubular structures; supercapacitors; vanadium sulfide

Autoři

ZAZPE, R.; SEPÚLVEDA SEPÚLVEDA, L.; RODRIGUEZ PEREIRA, J.; HROMÁDKO, L.; MICHALIČKA, J.; KOLÍBALOVÁ, E.; KURKA, M.; THALLURI, S.; SOPHA, H.; MACÁK, J.

Vydáno

1. 4. 2024

Nakladatel

WILEY

Místo

HOBOKEN

ISSN

2688-4062

Periodikum

Small Structures

Ročník

5

Číslo

4

Stát

Spolková republika Německo

Strany počet

10

URL

https://onlinelibrary.wiley.com/doi/10.1002/sstr.202300512

BibTex

@article{BUT188934,
  author="Raúl {Zazpe Mendioroz} and Lina Marcela {Sepúlveda Sepúlveda} and Jhonatan {Rodriguez Pereira} and Luděk {Hromádko} and Jan {Michalička} and Eva {Kolíbalová} and Michal {Kurka} and Sitaramanjaneya Mouli {Thalluri} and Hanna Ingrid {Sopha} and Jan {Macák}",
  title="Low-Temperature Atomic Layer Deposition Synthesis of Vanadium Sulfide (Ultra)Thin Films for Nanotubular Supercapacitors",
  journal="Small Structures",
  year="2024",
  volume="5",
  number="4",
  pages="10",
  doi="10.1002/sstr.202300512",
  issn="2688-4062",
  url="https://onlinelibrary.wiley.com/doi/10.1002/sstr.202300512"
}