Detail publikace

Hydrofluoric acid-free etched MAX on 3D-printed nanocarbon electrode for photoelectrochemical hydrogen production

NOUSEEN, S. GHOSH, K. PUMERA, M.

Originální název

Hydrofluoric acid-free etched MAX on 3D-printed nanocarbon electrode for photoelectrochemical hydrogen production

Typ

článek v časopise ve Web of Science, Jimp

Jazyk

angličtina

Originální abstrakt

MXenes have emerged as a promising material for a disparate range of photo-electrochemical conversion and energy storage devices. However, most reported synthesis process involves hydrofluoric acid (HF) and fluoridebased compounds. HF severe toxicity persists impediment to the scalable production and fabrication of MXenes. Thus, fluoride-free protocols are currently being explored. Here, we demonstrate a novel fluoride-free protocol for the etching of the MAX phase (Ti3AlC2) utilizing an acidic mixture of nitric acid, phosphoric acid, and acetic acid. Such acidic etching modulated the electronic structure and chemical composition of the MAX surface converting it into MAX-derived flower-like titanium phosphate and titanium oxide which boosts its photoelectrochemical properties. The photo-electrochemical hydrogen evolution reaction is evaluated using 3Dprinted and screen-printed carbon electrodes exposing under visible light illumination with 365 and 460 nm wavelengths. Such HF-free etched Ti3AlC2 MAX and the MAX-derived flower-like titanium phosphate and titanium oxide coated 3D-printed nanocarbon and screen-printed carbon electrodes demonstrate a novel process to be applied for an energy conversion application. This work will pave the way to etch other MAX phases through an environment-friendly and easy-handling technique that is to be used beyond photo-electrochemical applications.

Klíčová slova

2D materials; MXenes; HF free etching; Ti 3 AlC 2 MAX; 3D-printed nanocarbon electrode; Photo-electrochemical hydrogen evolution; reaction

Autoři

NOUSEEN, S.; GHOSH, K.; PUMERA, M.

Vydáno

1. 2. 2024

Nakladatel

ELSEVIER

Místo

AMSTERDAM

ISSN

2352-9407

Periodikum

Applied Materials Today

Ročník

36

Číslo

101995

Stát

Nizozemsko

Strany počet

10

URL

https://www.sciencedirect.com/science/article/pii/S2352940723002640?via%3Dihub

BibTex

@article{BUT196604,
  author="Shaista {Nouseen} and Kalyan {Ghosh} and Martin {Pumera}",
  title="Hydrofluoric acid-free etched MAX on 3D-printed nanocarbon electrode for photoelectrochemical hydrogen production",
  journal="Applied Materials Today",
  year="2024",
  volume="36",
  number="101995",
  pages="10",
  doi="10.1016/j.apmt.2023.101995",
  issn="2352-9407",
  url="https://www.sciencedirect.com/science/article/pii/S2352940723002640?via%3Dihub"
}