Detail publikace

Thin alumina film as a mask for ordered nanostructures by deposition technique

Radim Hrdý, Jaromír Hubálek

Originální název

Thin alumina film as a mask for ordered nanostructures by deposition technique

Typ

článek ve sborníku ve WoS nebo Scopus

Jazyk

angličtina

Originální abstrakt

The alumina pore nanostructures has attracted attention because of its self-ordered hexagonal structure. It can be used as a template nanosize structure, for many devices such as magnetic, electronic and optoelectronic. The aim of this method is preparation of the mask for electrodepositing nanowires directly on Si substrate. The presented technique without utilization of high-resolution electron-beam lithographs belongs to low-cost technology in the microelectronic industry. Anodic alumina has been prepared in several electrolytes by the anodization process and the characteristics of pore structures have been studied in different anodizing conditions. The thickness of aluminum film for anodization was 1-2 um. The two methods for deposition of aluminum thin film on Si substrate are thermal evaporating and sputtering. The prepared alumina structures have 15-30 nm pore diameters and 30-110 nm interpore distances. The anodization of thin alumina film deposited on Si substrate is a complicated process in comparison with the anodization of aluminum sheet but the unique properties of this method are stability of the prepared structure and simple manipulation in other operations.

Klíčová slova

Nanomachinig, pore alumina, electrodeposition

Autoři

Radim Hrdý, Jaromír Hubálek

Rok RIV

2006

Vydáno

25. 4. 2006

Místo

Košice

Strany od

87

Strany do

87

Strany počet

1

BibTex

@inproceedings{BUT24676,
  author="Radim {Hrdý} and Jaromír {Hubálek}",
  title="Thin alumina film as a mask for ordered nanostructures by deposition technique",
  booktitle="Book of Abstracts",
  year="2006",
  pages="1",
  address="Košice"
}