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ČECH, V. PŘIKRYL, R. SALYK, O.
Originální název
Thin Plasma Polymer Films Of Hexamethyldisiloxane
Typ
článek ve sborníku ve WoS nebo Scopus
Jazyk
angličtina
Originální abstrakt
Plasma enhanced chemical vapor technology was used to prepare thin polymer film from a vapor of hexamethyldisiloxane (HMDSO) monomer. An influence of deposition conditions on properties of films was observed. Plasma processes were diagnosticated employing the mass spectroscopy. Chemical composition and structure of prepared layers were studied by the infrared spectroscopy (FTIR) and the electron spectroscopy for chemical analysis (ESCA). Surface morphology of films was observed by the scanning electron microscopy (SEM), the profilometer Talystep and the atomic force microscopy (AFM). We measured the surface energy, evaluated the thermal stability using thermogravimetric analysis together with the mass spectroscopy and investigated an adhesion of films to substrates. Some mechanical properties were tested as well.
Klíčová slova
thin film, plasma polymerization
Autoři
ČECH, V.; PŘIKRYL, R.; SALYK, O.
Rok RIV
2000
Vydáno
30. 6. 2000
Nakladatel
UK Praha
Místo
Praha
ISBN
80-85863-59-6
Kniha
Proceedings of WDS 2000
Strany od
318
Strany do
321
Strany počet
4
BibTex
@inproceedings{BUT2561, author="Vladimír {Čech} and Ota {Salyk} and Radek {Přikryl}", title="Thin Plasma Polymer Films Of Hexamethyldisiloxane", booktitle="Proceedings of WDS 2000", year="2000", pages="4", publisher="UK Praha", address="Praha", isbn="80-85863-59-6" }