Detail publikace

Fabrication of Anodized Porous Alumina on Thin Film Annealed at Different Temperatures

HRDÝ, R. MACHÁČKOVÁ, M. DRBOHLAVOVÁ, J. HUBÁLEK, J.

Originální název

Fabrication of Anodized Porous Alumina on Thin Film Annealed at Different Temperatures

Typ

článek ve sborníku ve WoS nebo Scopus

Jazyk

angličtina

Originální abstrakt

This work is focused on the effect of thin evaporated aluminum film anneling at different temperatures. In our case, the P-type silicon wafers were used as substrate for evaporation of pure aluminum. Then, each wafer was annealed in nitrogen atmosphere at temperature range of 300-400 Celsius degree. All samples were analyzed by SEM and AFM.

Klíčová slova

anodization, alumina, annealing, crystal structure

Autoři

HRDÝ, R.; MACHÁČKOVÁ, M.; DRBOHLAVOVÁ, J.; HUBÁLEK, J.

Rok RIV

2008

Vydáno

10. 9. 2009

Nakladatel

Ing. Zdeněk Novotný, CSc.

Místo

Brno

ISBN

978-80-214-3717-3

Kniha

EDS 09 IMAPS CS International Conference Proceedings

Číslo edice

1

Strany od

214

Strany do

218

Strany počet

5

BibTex

@inproceedings{BUT30083,
  author="Radim {Hrdý} and Marina {Macháčková} and Jana {Drbohlavová} and Jaromír {Hubálek}",
  title="Fabrication of Anodized Porous Alumina on Thin Film Annealed at Different Temperatures",
  booktitle="EDS 09 IMAPS CS International Conference Proceedings",
  year="2009",
  number="1",
  pages="214--218",
  publisher="Ing. Zdeněk Novotný, CSc.",
  address="Brno",
  isbn="978-80-214-3717-3"
}