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ČECH, V. INAGAKI, N. VANĚK, J. PŘIKRYL, R. GRYCOVÁ, A. ZEMEK, J.
Originální název
Plasma-polymerized versus polycondensed thin films of vinyltriethoxysilane
Typ
článek v časopise - ostatní, Jost
Jazyk
angličtina
Originální abstrakt
Plasma-polymerized and polycondensed thin films of vinyltriethoxysilane were deposited on planar glass substrates and glass fibers using plasma-enhanced chemical vapor deposition and a wet chemical process. Deposited films were extensively characterized by microscopic and spectroscopic techniques and indentation tests in order to compare their elemental composition, chemical structure, wettability, elastic modulus, hardness, and adhesion. The physicochemical properties of the polycondensed films were invariable, while those of the plasma-polymerized films could be varied in relatively wide ranges by altering the deposition conditions.
Klíčová slova
Chemical vapor deposition; Plasma processing and deposition; Organosilicon
Autoři
ČECH, V.; INAGAKI, N.; VANĚK, J.; PŘIKRYL, R.; GRYCOVÁ, A.; ZEMEK, J.
Rok RIV
2006
Vydáno
27. 11. 2006
ISSN
0040-6090
Periodikum
Thin Solid Films
Ročník
502
Číslo
1
Stát
Nizozemsko
Strany od
181
Strany do
187
Strany počet
7
BibTex
@article{BUT43591, author="Vladimír {Čech} and Norihiro {Inagaki} and Jan {Vaněk} and Radek {Přikryl} and Alena {Grycová} and Josef {Zemek}", title="Plasma-polymerized versus polycondensed thin films of vinyltriethoxysilane", journal="Thin Solid Films", year="2006", volume="502", number="1", pages="181--187", issn="0040-6090" }