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KOLÍBAL, M. TOMANEC, O. PRŮŠA, S. PLOJHAR, M. MARKIN, S. DITTRICHOVÁ, L. SPOUSTA, J. BAUER, P. ŠIKOLA, T.
Originální název
TOF-LEIS spectra of Ga/Si: Peak shape analysis
Typ
článek v časopise - ostatní, Jost
Jazyk
angličtina
Originální abstrakt
Low energy ion scattering (LEIS) is used to characterize Ga layers deposited onto Si(111)-(7x7) substrates at different deposition temperatures. The Ga/Si system exhibits a pronounced 3D island growth and thus is a suitable object to investigate the relation between LEIS-peak shapes and the morphology of thin films. It is shown that up to a certain critical depth (a few MLs) the single scattering component can be used as a measure of the number of surface Ga atoms per unit area. If a higher amount of Ga is deposited, the single scattering model is not valid anymore and multiple scattering becomes significant. The Ga peak starts to be asymmetric with a well developed multiple scattering component. Such a component can be utilized for the observation of the morphology of the layers. It was found that the more intensive the 3D growth of adsorbed Ga atoms on the Si(111) substrate, the more pronounced is the multiple scattering yield for a given amount of Ga.
Klíčová slova
Low energy ion scattering; Morphology; Growth; Gallium; Silicon
Autoři
KOLÍBAL, M.; TOMANEC, O.; PRŮŠA, S.; PLOJHAR, M.; MARKIN, S.; DITTRICHOVÁ, L.; SPOUSTA, J.; BAUER, P.; ŠIKOLA, T.
Rok RIV
2007
Vydáno
1. 12. 2007
ISSN
0168-583X
Periodikum
Nuclear Instruments and Methods in Physics Research B
Ročník
265
Číslo
2
Stát
Nizozemsko
Strany od
569
Strany do
575
Strany počet
7
BibTex
@article{BUT44960, author="Miroslav {Kolíbal} and Ondřej {Tomanec} and Stanislav {Průša} and Martin {Plojhar} and S. N. {Markin} and Libuše {Dittrichová} and Jiří {Spousta} and P. {Bauer} and Tomáš {Šikola}", title="TOF-LEIS spectra of Ga/Si: Peak shape analysis", journal="Nuclear Instruments and Methods in Physics Research B", year="2007", volume="265", number="2", pages="569--575", issn="0168-583X" }