Detail publikace

Plasma Diagnostic During Deposition Processes of Silane Based Thin Films

Rašková, Z., Brandejs, K., Krčma, F., Vaněk, J.

Originální název

Plasma Diagnostic During Deposition Processes of Silane Based Thin Films

Typ

článek v časopise - ostatní, Jost

Jazyk

angličtina

Originální abstrakt

Our work deals with the identification of the intensive spectral lines and bands measured during the plasma deposition using the hexamethyldisiloxane (HMDSO) and the tetravinylsilane (TVS) as monomer. The deposition processes were carried out in a continual regime as well as in a pulsed regime with the varied relative pulse duration. At first, the pure monomers were used. Furthermore, tetravinylsilane was mixed in various ratios with oxygen, the CH4 + H2 gas mixture was added to hexamethyldisiloxane. We observed a lot of changes in intensity and character of spectra with increasing pulse duration, with increasing oxygen flow rate. Oxygen has an important role for the creation of various fragments and cyclic oligomers. In the next part of experiment, exhaust gas was investigated by gas-chromatography and mass spectrometry (GC-MS). Oligomers with complex structure were identified.

Klíčová slova

optical spectrum, tetravinylsilane, effective power

Autoři

Rašková, Z., Brandejs, K., Krčma, F., Vaněk, J.

Rok RIV

2004

Vydáno

10. 6. 2004

Nakladatel

AV ČR

Místo

Praha

ISSN

0011-4626

Periodikum

Czechoslovak Journal of Physics

Ročník

54

Číslo

C

Stát

Česká republika

Strany od

1036

Strany do

1041

Strany počet

6

BibTex

@article{BUT46187,
  author="Zuzana {Rašková} and Kamil {Brandejs} and František {Krčma} and Jan {Vaněk}",
  title="Plasma Diagnostic During Deposition Processes of Silane Based Thin Films",
  journal="Czechoslovak Journal of Physics",
  year="2004",
  volume="54",
  number="C",
  pages="6",
  issn="0011-4626"
}