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Detail publikace
Rašková, Z., Brandejs, K., Krčma, F., Vaněk, J.
Originální název
Plasma Diagnostic During Deposition Processes of Silane Based Thin Films
Typ
článek v časopise - ostatní, Jost
Jazyk
angličtina
Originální abstrakt
Our work deals with the identification of the intensive spectral lines and bands measured during the plasma deposition using the hexamethyldisiloxane (HMDSO) and the tetravinylsilane (TVS) as monomer. The deposition processes were carried out in a continual regime as well as in a pulsed regime with the varied relative pulse duration. At first, the pure monomers were used. Furthermore, tetravinylsilane was mixed in various ratios with oxygen, the CH4 + H2 gas mixture was added to hexamethyldisiloxane. We observed a lot of changes in intensity and character of spectra with increasing pulse duration, with increasing oxygen flow rate. Oxygen has an important role for the creation of various fragments and cyclic oligomers. In the next part of experiment, exhaust gas was investigated by gas-chromatography and mass spectrometry (GC-MS). Oligomers with complex structure were identified.
Klíčová slova
optical spectrum, tetravinylsilane, effective power
Autoři
Rok RIV
2004
Vydáno
10. 6. 2004
Nakladatel
AV ČR
Místo
Praha
ISSN
0011-4626
Periodikum
Czechoslovak Journal of Physics
Ročník
54
Číslo
C
Stát
Česká republika
Strany od
1036
Strany do
1041
Strany počet
6
BibTex
@article{BUT46187, author="Zuzana {Rašková} and Kamil {Brandejs} and František {Krčma} and Jan {Vaněk}", title="Plasma Diagnostic During Deposition Processes of Silane Based Thin Films", journal="Czechoslovak Journal of Physics", year="2004", volume="54", number="C", pages="6", issn="0011-4626" }