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HRNČIŘÍK, P., MULLEROVÁ, I.
Originální název
EXAMINATION OF NANOSTRUCTURES BY ELECTRON BEAM
Typ
abstrakt
Jazyk
angličtina
Originální abstrakt
The scanning electron microscope (SEM) equipped with the cathode lens enables one to image the specimen within full scale of electron energies with nearly unchanged image resolution. In the very low energy range (units to hundreds of eV), not available in classical SEM (units to tens of keV), new contrasts appear that reflect local chemical, crystallinic and electronic properties of the specimen. Interpretation of the image is hence often ambiguous. Important alternative is combination with a complementary technique, particularly with the scanning Auger electron microscopy revealing the elemental composition within the information depth similar to that of the low energy SEM. In the frame of this project an ultrahigh vacuum (UHV) apparatus with the field-emission electron gun is being completed with both methods implemented at the image resolution in the nm range. The elaborated method will be applied to examination of selected semiconductor structures, multilayers and composites based on metal alloys.
Klíčová slova v angličtině
nanostructures, ultrahigh vacuum, SEM
Autoři
Vydáno
1. 1. 2004
Nakladatel
Department for Nanostructured Materials, Jožef Stefan Institute
Místo
Slovinsko
Strany od
139
Strany do
Strany počet
1
BibTex
@misc{BUT59948, author="Petr {Hrnčiřík} and Ilona {Müllerová}", title="EXAMINATION OF NANOSTRUCTURES BY ELECTRON BEAM", booktitle="Electron Probe Microanalysis Today", year="2004", pages="1", publisher="Department for Nanostructured Materials, Jožef Stefan Institute", address="Slovinsko", note="abstract" }