Detail publikace

Novel plasma reactor with bottom rotary electrode for Plasma-enhanced chemical vapor deposition of nanostructured films

PŘIKRYL, R. ČECH, V. HEDBAVNY, P. INAGAKI, N.

Originální název

Novel plasma reactor with bottom rotary electrode for Plasma-enhanced chemical vapor deposition of nanostructured films

Typ

abstrakt

Jazyk

angličtina

Originální abstrakt

The aim of article is description of newly designed system for nanotechnology realised via PE-CVD technique

Klíčová slova

PECVD, NANO, technology

Autoři

PŘIKRYL, R.; ČECH, V.; HEDBAVNY, P.; INAGAKI, N.

Vydáno

12. 8. 2005

Nakladatel

Centre for Advanced coatings Technology, University of Toronto

Místo

Toronto

Strany od

423

Strany do

424

Strany počet

2

BibTex

@misc{BUT60241,
  author="Radek {Přikryl} and Vladimír {Čech} and Pavel {Hedbavny} and Norihiro {Inagaki}",
  title="Novel plasma reactor with bottom rotary electrode for Plasma-enhanced chemical vapor deposition of nanostructured films",
  booktitle="Proceedings of 17th symposium on plasma chemistry",
  year="2005",
  pages="423--424",
  publisher="Centre for Advanced coatings Technology, University of Toronto",
  address="Toronto",
  note="abstract"
}