Detail publikace

Multilayered and Functionally Gradient Thin Films of Plasma Polymers

HOFEREK, L. ČECH, V.

Originální název

Multilayered and Functionally Gradient Thin Films of Plasma Polymers

Typ

abstrakt

Jazyk

angličtina

Originální abstrakt

Plasma polymer films in the form of hydrogenated amorphous carbon-silicon (a-SiC:H) or carbon-silicon oxide (a-SiOC:H) alloy are often used as barrier or protective layers for polymer and metal substrates, cutting tools, electronic, and optoelectronic devices. Properties of the devices are influenced by interfacial phenomena. To eliminate or at least reduce the internal stresses and improve adhesion, mostly multilayered rather than a single layer film has to be used. Such multilayers may be used for passivation of organic devices, as a dielectric barrier in semiconductor devices, as tribological coatings in aeronautical applications, or as a functional coating in polymer composites with controlled interphase.

Klíčová slova

plasma polymerization, thin films

Autoři

HOFEREK, L.; ČECH, V.

Vydáno

27. 12. 2010

Strany od

1

Strany do

1

Strany počet

1

BibTex

@misc{BUT60974,
  author="Lukáš {Hoferek} and Vladimír {Čech}",
  title="Multilayered and Functionally Gradient Thin Films of Plasma Polymers",
  booktitle="IS Plasma 2010",
  year="2010",
  edition="1",
  pages="1--1",
  note="abstract"
}