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HOFEREK, L. ČECH, V.
Originální název
Multilayered and Functionally Gradient Thin Films of Plasma Polymers
Typ
abstrakt
Jazyk
angličtina
Originální abstrakt
Plasma polymer films in the form of hydrogenated amorphous carbon-silicon (a-SiC:H) or carbon-silicon oxide (a-SiOC:H) alloy are often used as barrier or protective layers for polymer and metal substrates, cutting tools, electronic, and optoelectronic devices. Properties of the devices are influenced by interfacial phenomena. To eliminate or at least reduce the internal stresses and improve adhesion, mostly multilayered rather than a single layer film has to be used. Such multilayers may be used for passivation of organic devices, as a dielectric barrier in semiconductor devices, as tribological coatings in aeronautical applications, or as a functional coating in polymer composites with controlled interphase.
Klíčová slova
plasma polymerization, thin films
Autoři
HOFEREK, L.; ČECH, V.
Vydáno
27. 12. 2010
Strany od
1
Strany do
Strany počet
BibTex
@misc{BUT60974, author="Lukáš {Hoferek} and Vladimír {Čech}", title="Multilayered and Functionally Gradient Thin Films of Plasma Polymers", booktitle="IS Plasma 2010", year="2010", edition="1", pages="1--1", note="abstract" }