Detail publikace

Negatively Charged Al2O3 Layers Deposited by Magnetron Sputtering and Vacuum Evaporation for Crystalline Silicon Solar Cell BSF

HÉGR, O. BAŘINKA, R. PORUBA, A.

Originální název

Negatively Charged Al2O3 Layers Deposited by Magnetron Sputtering and Vacuum Evaporation for Crystalline Silicon Solar Cell BSF

Typ

článek ve sborníku ve WoS nebo Scopus

Jazyk

angličtina

Originální abstrakt

The main goal of our work is utilization of well established vacuum technologies as magnetron sputtering and vacuum evaporation for transfer of the aluminum oxide deposition process from ALD (Atomic layer deposition) technique to the industrial sputtering system with the aim to implement high quality back-surface field (BSF) passivation into a large and effective deposition system in the technology processes of Solartec company. The passivation effect is tested by MW-PCD (Microwave Photoconductance Decay) measuring method with deposition of identical passivation layers on both sides of Czochralski (CZ) p- and n-type substrates.

Klíčová slova

ALD, magnetron sputtering, vacuum evaporation, Back-Side Field, rear side passivation

Autoři

HÉGR, O.; BAŘINKA, R.; PORUBA, A.

Rok RIV

2011

Vydáno

31. 10. 2011

Nakladatel

WIP Wirtschaft und Infrastruktur GmbH & Co Planungs KG

Místo

Sylvensteinstr. 2 81369 München Germany

ISBN

3-936338-27-2

Kniha

EU PVSEC Proceedings, 26th European Photovoltaic Solar Energy Conference and Exhibition

Strany od

1783

Strany do

1786

Strany počet

4

BibTex

@inproceedings{BUT74209,
  author="Ondřej {Hégr} and Radim {Bařinka} and Aleš {Poruba}",
  title="Negatively Charged Al2O3 Layers Deposited by Magnetron Sputtering and Vacuum Evaporation for Crystalline Silicon Solar Cell BSF",
  booktitle="EU PVSEC Proceedings, 26th European Photovoltaic Solar Energy Conference and Exhibition",
  year="2011",
  pages="1783--1786",
  publisher="WIP Wirtschaft und Infrastruktur GmbH & Co Planungs KG",
  address="Sylvensteinstr. 2
81369 München
Germany",
  isbn="3-936338-27-2"
}