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Detail publikace
RAŠKOVÁ, Z., ŠORMOVÁ, H., HAVELKOVÁ, I., KRČMA, F., VANĚK, J., PŘIKRYL, R., ČECH, V.
Originální název
Spectroscopic Observation of Plasma Deposition of Thin Silane and Siloxane Based Films
Typ
článek ve sborníku ve WoS nebo Scopus
Jazyk
angličtina
Originální abstrakt
The spectroscopic studies have been focused on the basic characterization of the RF discharge conditions during the films deposition. In the discharge spectra many different species has been determined. To characterize the neutral gas temperature the small amount of nitrogen has been involved into the discharge. The dependencies of the temperature and the molecular excitations in the discharge have been initially studied on the total discharge power and gas composition. The correlation among the discharge parameters and the final layer properties will be subject of the following studies.
Klíčová slova
Low temperature plasma deposition, Optical emission spectroscopy
Autoři
Rok RIV
2003
Vydáno
1. 4. 2003
Nakladatel
Universita Bari
Místo
Bari
Strany od
214
Strany do
217
Strany počet
4
BibTex
@inproceedings{BUT8827, author="Zuzana {Rašková} and Hana {Šormová} and Iveta {Havelková} and František {Krčma} and Jan {Vaněk} and Radek {Přikryl} and Vladimír {Čech}", title="Spectroscopic Observation of Plasma Deposition of Thin Silane and Siloxane Based Films", booktitle="Proceedings of Frontiers in Low Temperature Plasma Diagnostics V", year="2003", number="1", pages="4", publisher="Universita Bari", address="Bari" }