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Detail publikace
RAŠKOVÁ, Z., ŠORMOVÁ, H., HAVELKOVÁ, I., KRČMA, F., VANĚK, J., PŘIKRYL, R., ČECH, V.
Originální název
Spectroscopic monitoring of low pressure plasma deposition of Silane and Siloxane based thin films
Typ
článek ve sborníku ve WoS nebo Scopus
Jazyk
angličtina
Originální abstrakt
The main part of this work is focused on the identification of the spectra measured during the plasma deposition using the vinyltriethoxysilane in a continual regime and also in a pulsed regime with the varied relative pulse duration and during deposition with an amount of oxygen added in various ratios. The next part is focused on spectroscopic observation during the plasma deposition using the hexamethyldisiloxane and gamma-metacryloxyprophyltrimethoxysilane.
Klíčová slova
Plasma deposition, optical emission spectroscopy, organosilicones
Autoři
Rok RIV
2003
Vydáno
15. 11. 2003
Nakladatel
MATFYZPRESS
Místo
Praha
ISBN
80-86732-18-5
Kniha
Proceedings of the 12th Annual Conference of Doctoral Students - WDS 2003
Číslo edice
1
Strany od
441
Strany do
445
Strany počet
5
BibTex
@inproceedings{BUT8852, author="Zuzana {Rašková} and Hana {Šormová} and Iveta {Havelková} and František {Krčma} and Jan {Vaněk} and Radek {Přikryl} and Vladimír {Čech}", title="Spectroscopic monitoring of low pressure plasma deposition of Silane and Siloxane based thin films", booktitle="Proceedings of the 12th Annual Conference of Doctoral Students - WDS 2003", year="2003", number="1", pages="5", publisher="MATFYZPRESS", address="Praha", isbn="80-86732-18-5" }