Detail publikace

Metody povrchové a tenkovrstvové analýzy prvkového složení (XPS, AES, SIMS), dirfrakce elektronů.

BÁBOR, P. MAŠEK, K.

Originální název

Metody povrchové a tenkovrstvové analýzy prvkového složení (XPS, AES, SIMS), dirfrakce elektronů.

Anglický název

Methods of surface and thin film analysisof chemical composition, photoelectron diffraction

Typ

článek v časopise - ostatní, Jost

Jazyk

čeština

Originální abstrakt

The goal of this article is to provide basic information on the physical principles and applications of the following mentioned methods. Chemical composition belongs to the basic characterization of materials used in many technological applications. X-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy (AES) are widely used for the investigation of chemical composition as well as of chemical state of solid surfaces. X-ray photoelectron diffraction (XPD) is a technique providing information on the detail crystallographic structure of single-crystal surfaces and epitaxial thin films of geometry of bonding ordered adsorbates. Secondary ion mass spectroscopy (SIMS) is more sensitive for measurement of low concentration species comparing to the electron spectroscopy techniques and, in addition, it permits elemental and compositional depth profiling.

Anglický abstrakt

The goal of this article is to provide basic information on the physical principles and applications of the following mentioned methods. Chemical composition belongs to the basic characterization of materials used in many technological applications. X-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy (AES) are widely used for the investigation of chemical composition as well as of chemical state of solid surfaces. X-ray photoelectron diffraction (XPD) is a technique providing information on the detail crystallographic structure of single-crystal surfaces and epitaxial thin films of geometry of bonding ordered adsorbates. Secondary ion mass spectroscopy (SIMS) is more sensitive for measurement of low concentration species comparing to the electron spectroscopy techniques and, in addition, it permits elemental and compositional depth profiling.

Klíčová slova

XPS, AES, SIMS, fotoelektronová difrakce

Klíčová slova v angličtině

XPS, AES, SIMS, photoelectron spectroscopy

Autoři

BÁBOR, P.; MAŠEK, K.

Rok RIV

2011

Vydáno

1. 12. 2011

ISSN

1211-5894

Periodikum

Materials Structure

Ročník

2011

Číslo

18

Stát

Česká republika

Strany od

251

Strany do

257

Strany počet

7

BibTex

@article{BUT89985,
  author="Petr {Bábor} and Karel {Mašek}",
  title="Metody povrchové a tenkovrstvové analýzy prvkového složení (XPS, AES, SIMS), dirfrakce elektronů.",
  journal="Materials Structure",
  year="2011",
  volume="2011",
  number="18",
  pages="251--257",
  issn="1211-5894"
}