Detail publikace

Morphology and structural investigation of aluminum nitride layers prepared by magnetron sputtering

DALLAEVA, D.

Originální název

Morphology and structural investigation of aluminum nitride layers prepared by magnetron sputtering

Typ

článek ve sborníku ve WoS nebo Scopus

Jazyk

angličtina

Originální abstrakt

Aluminum nitride thin films were obtained by magnetron sputtering of aluminum target. The films surface was studied by atomic force microscopy and scanning electron microscopy. Using of buffer nitridized layer on the substrate allowed the formation of perfect structure films. Lateral force atomic force microscopy was used to study the morphology heterogeneity. The dependence of films structure on the formation conditions has been defined. The objective of the study is to contribute to the improvement of technological process of dry etching and film deposition.

Klíčová slova

dry etching, epitaxy, substrate, thin film, scanning probe microscopy

Autoři

DALLAEVA, D.

Rok RIV

2013

Vydáno

25. 4. 2013

Nakladatel

Litera, Tabor 43a, 61200 Brno

Místo

Brno University of Technology

ISBN

978-80-214-4695-3

Kniha

Proceedings of the 19th Conference Student EEICT 2013

Edice

první

Strany od

134

Strany do

138

Strany počet

5

BibTex

@inproceedings{BUT99437,
  author="Dinara {Sobola}",
  title="Morphology and structural investigation of aluminum nitride layers prepared by magnetron sputtering",
  booktitle="Proceedings of the 19th Conference Student EEICT 2013",
  year="2013",
  series="první",
  pages="134--138",
  publisher="Litera, Tabor 43a, 61200 Brno",
  address="Brno University of Technology",
  isbn="978-80-214-4695-3"
}