Detail publikace

PECVD Characterization During the Deposition of Thin Fluorocarbon Films

BALAŠTÍKOVÁ, R. KRČMA, F. TATOULIAN, M.

Originální název

PECVD Characterization During the Deposition of Thin Fluorocarbon Films

Typ

abstrakt

Jazyk

angličtina

Originální abstrakt

This presentation focuses on plasma diagnostic of the deposition process during the preparation of the thin film prepared by a PECVD technique. The discharge was monitored using optical emission spectroscopy and in situ mass spectrometry.

Klíčová slova

PECVD, fluorocarbon thin films, plasma diagnostics

Autoři

BALAŠTÍKOVÁ, R.; KRČMA, F.; TATOULIAN, M.

Vydáno

28. 4. 2013

Nakladatel

Eindhoven University

Místo

Eindhoven

Strany od

P1-2

Strany do

P1-2

Strany počet

1